Graphene-Based Ammonia Sensors Functionalised with Sub-Monolayer V2O5: A Comparative Study of Chemical Vapour Deposited and Epitaxial Graphene †.

Graphene in its pristine form has demonstrated a gas detection ability in an inert carrier gas. For practical use in ambient atmosphere, its sensor properties should be enhanced with functionalisation by defects and dopants, or by decoration with nanophases of metals or/and metal oxides. Excellent sensor behaviour was found for two types of single layer graphenes: grown by chemical vapour deposition (CVD) and transferred onto oxidized silicon (Si/SiO2/CVDG), and the epitaxial graphene grown on SiC (SiC/EG). Both graphene samples were functionalised using a pulsed laser deposited (PLD) thin V2O5 layer of average thickness ≈ 0.6 nm. According to the Raman spectra, the SiC/EG has a remarkable resistance against structural damage under the laser deposition conditions. By contrast, the PLD process readily induces defects in CVD graphene. Both sensors showed remarkable and selective sensing of NH3 gas in terms of response amplitude and speed, as well as recovery rate. SiC/EG showed a response that was an order of magnitude larger as compared to similarly functionalised CVDG sensor (295% vs. 31% for 100 ppm NH3). The adsorption site properties are assigned to deposited V2O5 nanophase, being similar for both sensors, rather than (defect) graphene itself. The substantially larger response of SiC/EG sensor is probably the result of the smaller initial free charge carrier doping in EG.

Layered Heterostructure of Graphene and TiO2 as a Highly Sensitive and Stable Photoassisted NO2 Sensor.

As an atomically thin electric conductor with a low density of highly mobile charge carriers, graphene is a suitable transducer for molecular adsorption. In this study, we demonstrate that the adsorption properties can be significantly enhanced with a laser-deposited TiO2 nanolayer on top of single-layer CVD graphene, whereas the effective charge transfer between the TiO2-adsorbed gas molecules and graphene is retained through the interface. The formation of such a heterostructure with optimally a monolayer thick oxide combined with ultraviolet irradiation (wavelength 365 nm, intensity <1 mW/mm2) dramatically enhances the gas-sensing properties. It provides an outstanding sensitivity for detecting NO2 in the range of a few ppb to a few hundred ppb-s in air, with response times below 30 s at room temperature. The effect of visible light (436 and 546 nm) was much weaker, indicating that the excitations due to light absorption in TiO2 play an essential role, while the characteristics of gas responses imply the involvement of both photoinduced adsorption and desorption. The sensing mechanism was confirmed by theoretical simulations on a NO2@Ti8O16C50 complex under periodic boundary conditions. The proposed sensor structure has significant additional merits, such as relative insensitivity to other polluting gases (CO, SO2, NH3) and air humidity, as well as long-term stability (>2 years) in ambient air. The results pave the way for an emerging class of gas sensor structures based on stacked 2D materials incorporating highly charge-sensitive transducer and selective receptor layers.

Nanostructures Stacked on Hafnium Oxide Films Interfacing Graphene and Silicon Oxide Layers as Resistive Switching Media.

SiO2 films were grown to thicknesses below 15 nm by ozone-assisted atomic layer deposition. The graphene was a chemical vapor deposited on copper foil and transferred wet-chemically to the SiO2 films. On the top of the graphene layer, either continuous HfO2 or SiO2 films were grown by plasma-assisted atomic layer deposition or by electron beam evaporation, respectively. Micro-Raman spectroscopy confirmed the integrity of the graphene after the deposition processes of both the HfO2 and SiO2. Stacked nanostructures with graphene layers intermediating the SiO2 and either the SiO2 or HfO2 insulator layers were devised as the resistive switching media between the top Ti and bottom TiN electrodes. The behavior of the devices was studied comparatively with and without graphene interlayers. The switching processes were attained in the devices supplied with graphene interlayers, whereas in the media consisting of the SiO2-HfO2 double layers only, the switching effect was not observed. In addition, the endurance characteristics were improved after the insertion of graphene between the wide band gap dielectric layers. Pre-annealing the Si/TiN/SiO2 substrates before transferring the graphene further improved the performance.

Graphene functionalised by laser-ablated V2O5 for a highly sensitive NH3 sensor.

Graphene has been recognized as a promising gas sensing material. The response of graphene-based sensors can be radically improved by introducing defects in graphene using, for example, metal or metal oxide nanoparticles. We have functionalised CVD grown, single-layer graphene by applying pulsed laser deposition (PLD) of V2O5 which resulted in a thin V2O5 layer on graphene with average thickness of ≈0.6 nm. From Raman spectroscopy, it was concluded that the PLD process also induced defects in graphene. Compared to unmodified graphene, the obtained chemiresistive sensor showed considerable improvement of sensing ammonia at room temperature. In addition, the response time, sensitivity and reversibility were essentially enhanced due to graphene functionalisation by laser deposited V2O5. This can be explained by an increased surface density of gas adsorption sites introduced by high energy atoms in laser ablation plasma and formation of nanophase boundaries between deposited V2O5 and graphene.