Oxidation and Tribological Behavior of Ti-B-C-N-Si Nanocomposite Films Deposited by Pulsed Unbalanced Magnetron Sputtering.

Jang, Jaeho; Heo, Sungbo; Kim, Wang Ryeol; Kim, Jun-Ho; Nam, Dae-Geun; Kim, Kwang Ho; Park, Ikmin; Park, In-Wook

Jang, Jaeho; Heo, Sungbo; Kim, Wang Ryeol; Kim, Jun-Ho; Nam, Dae-Geun; Kim, Kwang Ho; Park, Ikmin; Park, In-Wook.

Afiliação

Jang J; Korea Institute of Industrial Technology (KITECH), Busan, 46742, South Korea.
Heo S; Korea Institute of Industrial Technology (KITECH), Busan, 46742, South Korea.
Kim WR; Korea Institute of Industrial Technology (KITECH), Busan, 46742, South Korea.
Kim JH; Korea Institute of Industrial Technology (KITECH), Busan, 46742, South Korea.
Nam DG; Korea Institute of Industrial Technology (KITECH), Busan, 46742, South Korea.
Kim KH; School of Materials Science and Engineering, Pusan National University, Busan, 46241, South Korea.
Park I; School of Materials Science and Engineering, Pusan National University, Busan, 46241, South Korea.
Park IW; Korea Institute of Industrial Technology (KITECH), Busan, 46742, South Korea.

J Nanosci Nanotechnol ; 18(3): 2100-2103, 2018 Mar 01.

Article em En | MEDLINE | ID: mdl-29448721

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: J Nanosci Nanotechnol Ano de publicação: 2018 Tipo de documento: Article País de afiliação: Coréia do Sul

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