Chromium/Nickel-Doped Silicon Oxide Thin-Film Electrode: Mechanism and Application to Microscale Light-Emitting Diodes.

Son, Kyung Rock; Lee, Byeong Ryong; Kim, Tae Geun

Son, Kyung Rock; Lee, Byeong Ryong; Kim, Tae Geun.

Afiliação

Son KR; School of Electrical Engineering , Korea University , Seongbuk-gu, Seoul 02841 , Korea.
Lee BR; School of Electrical Engineering , Korea University , Seongbuk-gu, Seoul 02841 , Korea.
Kim TG; School of Electrical Engineering , Korea University , Seongbuk-gu, Seoul 02841 , Korea.

ACS Appl Mater Interfaces ; 10(48): 40967-40972, 2018 Dec 05.

Article em En | MEDLINE | ID: mdl-30427178

Palavras-chave

Schottky barrier height; electrical doping treatment; hole injection; microscale light-emitting diodes; silicon oxide; transmittance

Texto completo

Imprimir

XML

PubMed Links

Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Assunto da revista: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Ano de publicação: 2018 Tipo de documento: Article

Texto completo

Imprimir

XML

PubMed Links

Buscar no Google