Nanoscale and Wafer Scale Study of Epitaxial Ruthenium Films on Amorphous SiO2 Substrate with van der Waals Graphene Buffer Layer.

Zhang, Lihua; Kisslinger, Kim; Lu, Zonghuan; Dhull, Neha; Kuan, Tung-Sheng; Washington, Morris; Lu, Toh-Ming; Wang, Gwo-Ching

Zhang, Lihua; Kisslinger, Kim; Lu, Zonghuan; Dhull, Neha; Kuan, Tung-Sheng; Washington, Morris; Lu, Toh-Ming; Wang, Gwo-Ching.

Afiliação

Zhang L; Brookhaven National Laboratory, Center for Functional Nanomaterials, Upton, NY, United States.
Kisslinger K; Brookhaven National Laboratory, Center for Functional Nanomaterials, Upton, NY, United States.
Lu Z; Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, NY, United States.
Dhull N; Center for Materials, Devices, and Integrated Systems (cMDIS), Rensselaer Polytechnic Institute, Troy, NY, United States.
Kuan TS; Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, NY, United States.
Washington M; Center for Materials, Devices, and Integrated Systems (cMDIS), Rensselaer Polytechnic Institute, Troy, NY, United States.
Lu TM; Department of Physics, University at Albany, State University of New York, Albany, NY, United States.
Wang GC; Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, NY, United States.

Microsc Microanal ; 29(Supplement_1): 1674-1675, 2023 Jul 22.

Article em En | MEDLINE | ID: mdl-37613865

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Microsc Microanal Ano de publicação: 2023 Tipo de documento: Article País de afiliação: Estados Unidos

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