Endothelial Cell Behavior and Nitric Oxide Production on a-C:H:SiOx-Coated Ti-6Al-4V Substrate.

This paper focuses on the surface modification of the Ti-6Al-4V alloy substrate via a-C:H:SiOx coating deposition. Research results concern the a-C:H:SiOx coating structure, investigated using transmission electron microscopy and in vitro endothelization to study the coating. Based on the analysis of the atomic radial distribution function, a model is proposed for the atomic short-range order structure of the a-C:H:SiOx coating, and chemical bonds (C-O, C-C, Si-C, Si-O, and Si-Si) are identified. It is shown that the a-C:H:SiOx coating does not possess prolonged cytotoxicity in relation to EA.hy926 endothelial cells. In vitro investigations showed that the adhesion, cell number, and nitric oxide production by EA.hy926 endothelial cells on the a-C:H:SiOx-coated Ti-6Al-4V substrate are significantly lower than those on the uncoated surface. The findings suggest that the a-C:H:SiOx coating can reduce the risk of endothelial cell hyperproliferation on implants and medical devices, including mechanical prosthetic heart valves, endovascular stents, and mechanical circulatory support devices.

Properties of TiAlN Coatings Obtained by Dual-HiPIMS with Short Pulses.

The paper focuses on the dual high-power impulse magnetron sputtering of TiAlN coatings using short pulses of high power delivered to the target. The surface morphology, elemental composition, phase composition, hardness, wear resistance, and adhesive strength of TiAlN coatings with different Al contents were investigated on WC-Co substrates. The heat resistance of the TiAlN coating was determined with synchrotron X-ray diffraction. The hardness of the TiAlN coating with a low Al content ranged from 17 to 30 GPa, and its wear rate varied between 1.8∙10-6 and 4.9∙10-6 mm3·N-1·m-1 depending on the substrate bias voltage. The HF1-HF2 adhesion strength of the TiAlN coatings was evaluated with the Daimler-Benz Rockwell C test. The hardness and wear rate of the Ti0.61Al0.39N coating were 26.5 GPa and 5.2∙10-6 mm3·N-1·m-1, respectively. The annealing process at 700 °C considerably worsened the mechanical properties of the Ti0.94Al0.06N coating, in contrast to the Ti0.61Al0.39N coating, which manifested a high oxidation resistance at annealing temperatures of 940-950 °C.

Morphofunctional reaction of leukocytes and platelets in in vitro contact with a-C:H:SiOx -coated Ti-6Al-4V substrate.

The article deals with the plasma-assisted chemical vapor deposition of 0.3-1.4 µm thick a-C:H:SiOx films in a mixture of argon and polyphenylmethylsiloxane vapor onto the Ti-6Al-4V alloy substrate, which is often used as an implant material. The a-C:H:SiOx film structure is studied by the Fourier-transform infrared and Raman spectroscopies. The pull-off adhesion test assesses the adhesive strength of a-C:H:SiOx films, and the ball-on-disk method is employed to measure their wear rate and friction coefficient. According to these studies, a-C:H:SiOx films are highly adhesive to the Ti-6Al-4V substrate, have low (0.056) friction coefficient and wear rate (9.8 × 10-8  mm3  N-1  m-1 ) in phosphate-buffered saline at 40°C. In vitro studies show neither thrombogenicity nor cytotoxicity of the a-C:H:SiOx film for the human blood mononuclear cells (hBMNCs). The in vitro contact between the hBMNC culture and a-C:H:SiOx films 0.8-1.4 µm thick deposited onto Ti-6Al-4V substrates reduces a 24-hour secretion of pro-inflammatory cytokines and chemokines IL-8, IL-17, TNFα, RANTES, and MCP-1. This reduction is more significant when the film thickness is 1.4 µm and implies its potential anti-inflammatory effect and possible application in cardiovascular surgery. The dependence is suggested for the concentration of anti-inflammatory cytokines and chemokines and the a-C:H:SiOx film thickness, which correlates with the surface wettability and electrostatic potential. The article discusses the possible applications of the anti-inflammatory effect and low thrombogenicity of a-C:H:SiOx films in cardiovascular surgery.

(Cr1-xAlx)N Coating Deposition by Short-Pulse High-Power Dual Magnetron Sputtering.

The paper deals with the (Cr1-xAlx)N coating containing 17 to 54 % Al which is deposited on AISI 430 stainless steel stationary substrates by short-pulse high-power dual magnetron sputtering of Al and Cr targets. The Al/Cr ratio in the coating depends on the substrate position relative to magnetrons. It is shown that the higher Al content in the (Cr1-xAlx)N coating improves its hardness from 17 to 28 GPa. Regardless of the Al content, the (Cr1-xAlx)N coating manifests a low wear rate, namely (4.1-7.8) × 10-9 and (3.9-5.3) × 10-7 mm3N-1m-1 in using metallic (100Cr6) and ceramic (Al2O3) counter bodies, respectively. In addition, this coating possesses the friction coefficient 0.4-0.7 and adhesive strength quality HF1 and HF2 indicating good interfacial adhesion according to the Daimler-Benz Rockwell-C adhesion test.

In Vitro Biodegradation of a-C:H:SiOx Films on Ti-6Al-4V Alloy.

This paper focuses mainly on the in vitro study of a five-week biodegradation of a-C:H:SiOx films of different thickness, obtained by plasma-assisted chemical vapor deposition onto Ti-6Al-4V alloy substrate using its pulsed bipolar biasing. In vitro immersion of a-C:H:SiOx films in a solution of 0.9% NaCl was used. It is shown how the a-C:H:SiOx film thickness (0.5-3 µm) affects the surface morphology, adhesive strength, and Na+ and Cl- precipitation on the film surface from the NaCl solution. With increasing film thickness, the roughness indices are reducing a little. The adhesive strength of the a-C:H:SiOx films to metal substrate corresponds to quality HF1 (0.5 µm in thickness) and HF2-HF3 (1.5-3 µm in thickness) of the Rockwell hardness test (VDI 3198) that defines strong interfacial adhesion and is usually applied in practice. The morphometric analysis of the film surface shows that on a-C:H:SiOx-coated Ti-6Al-4V alloy surface, the area occupied by the grains of sodium chloride is lower than on the uncoated surface. The reduction in the ion precipitation from 0.9% NaCl onto the film surface depended on the elemental composition of the surface layer conditioned by the thickness growth of the a-C:H:SiOx film. Based on the results of energy dispersive X-ray spectroscopy, the multiple regression equations are suggested to explain the effect of the elemental composition of the a-C:H:SiOx film on the decreased Na+ and Cl- precipitation. As a result, the a-C:H:SiOx films successfully combine good adhesion strength and rare ion precipitation and thus are rather promising for medical applications on cardiovascular stents and/or friction parts of heart pumps.