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1.
Materials (Basel) ; 13(9)2020 May 02.
Artículo en Inglés | MEDLINE | ID: mdl-32370218

RESUMEN

Multiple principal element alloys, also often referred to as compositionally complex alloys or high entropy alloys, present extreme challenges to characterize. They show a vast, multidimensional composition space that merits detailed investigation and optimization to identify compositions and to map the composition ranges where useful properties are maintained. Combinatorial thin film material libraries are a cost-effective and efficient way to create directly comparable, controlled composition variations. Characterizing them comes with its own challenges, including the need for high-speed, automated measurements of dozens to hundreds or more compositions to be screened. By selecting an appropriate thin film morphology through predictable control of critical deposition parameters, representative measured values can be obtained with less scatter, i.e., requiring fewer measurement repetitions for each particular composition. In the present study, equiatomic CoCrFeNi was grown by magnetron sputtering in different locations in the structure zone diagram applied to multinary element alloys, followed by microstructural and morphological characterizations. Increasing the energy input to the deposition process by increased temperature and adding high-power impulse magnetron sputtering (HiPIMS) plasma generators led to denser, more homogeneous morphologies with smoother surfaces until recrystallization and grain boundary grooving began. Growth at 300 °C, even without the extra particle energy input of HiPIMS generators, led to consistently repeatable nanoindentation load-displacement curves and the resulting hardness and Young's modulus values.

2.
ACS Comb Sci ; 21(12): 782-793, 2019 12 09.
Artículo en Inglés | MEDLINE | ID: mdl-31689080

RESUMEN

Cr-Al-N thin film materials libraries were synthesized by combinatorial reactive high power impulse magnetron sputtering (HiPIMS). Different HiPIMS repetition frequencies and peak power densities were applied altering the ion to growth flux ratio. Moreover, time-resolved ion energy distribution functions were measured with a retarding field energy analyzer (RFEA). The plasma properties were measured during the growth of films with different compositions within the materials library and correlated to the resulting film properties such as phase, grain size, texture, indentation modulus, indentation hardness, and residual stress. The influence of the ion to growth flux ratio on the film properties was most significant for films with high Al-content (xAl = 50 at. %). X-ray diffraction with a 2D detector revealed hcp-AlN precipitation starting from Al-concentration xAl ≥ 50 at. %. This precipitation might be related to the kinetically enhanced adatom mobility for a high ratio of ions per deposited atoms, leading to strong intermixing of the deposited species. A structure zone transition, induced by composition and flux ratio JI/JG, from zone T to zone Ic structure was observed which hints toward the conclusion that the combination of increasing flux ratio and Al-concentration lead to opposing trends regarding the increase in homologous temperature.


Asunto(s)
Aluminio/química , Cromo/química , Nitrógeno/química , Técnicas Químicas Combinatorias , Ensayo de Materiales , Estrés Mecánico
3.
Nanomaterials (Basel) ; 8(11)2018 Nov 04.
Artículo en Inglés | MEDLINE | ID: mdl-30400345

RESUMEN

Controlling the amorphous or crystalline state of multinary Cr-Mn-Fe-Co-Ni alloy nanoparticles with sizes in the range between ~1.7 nm and ~4.8 nm is achieved using three processing routes. Direct current sputtering from an alloy target in the ionic liquid 1-butyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide leads to amorphous nanoparticles as observed by high-resolution transmission electron microscopy. Crystalline nanoparticles can be achieved in situ in a transmission electron microscope by exposure to an electron beam, ex situ by heating in vacuum, or directly during synthesis by using a high-power impulse magnetron sputtering process. Growth of the nanoparticles with respect to the amorphous particles was observed. Furthermore, the crystal structure can be manipulated by the processing conditions. For example, a body-centered cubic structure is formed during in situ electron beam crystallization while longer ex situ annealing induces a face-centered cubic structure.

4.
ACS Appl Mater Interfaces ; 10(8): 7422-7434, 2018 Feb 28.
Artículo en Inglés | MEDLINE | ID: mdl-29338170

RESUMEN

A study on the plasma-enhanced atomic layer deposition of amorphous inorganic oxides SiO2 and Al2O3 on polypropylene (PP) was carried out with respect to growth taking place at the interface of the polymer substrate and the thin film employing in situ quartz-crystal microbalance (QCM) experiments. A model layer of spin-coated PP (scPP) was deposited on QCM crystals prior to depositions to allow a transfer of findings from QCM studies to industrially applied PP foil. The influence of precursor choice (trimethylaluminum (TMA) vs [3-(dimethylamino)propyl]-dimethyl aluminum (DMAD)) and of plasma pretreatment on the monitored QCM response was investigated. Furthermore, dyads of SiO2/Al2O3, using different Al precursors for the Al2O3 thin-film deposition, were investigated regarding their barrier performance. Although the growth of SiO2 and Al2O3 from TMA on scPP is significantly hindered if no oxygen plasma pretreatment is applied to the scPP prior to depositions, the DMAD process was found to yield comparable Al2O3 growth directly on scPP similar to that found on a bare QCM crystal. From this, the interface formed between the Al2O3 and the PP substrate is suggested to be different for the two precursors TMA and DMAD due to different growth modes. Furthermore, the residual stress of the thin films influences the barrier properties of SiO2/Al2O3 dyads. Dyads composed of 5 nm Al2O3 (DMAD) + 5 nm SiO2 exhibit an oxygen transmission rate (OTR) of 57.4 cm3 m-2 day-1, which correlates with a barrier improvement factor of 24 against 5 when Al2O3 from TMA is applied.

5.
Sci Technol Adv Mater ; 12(5): 054208, 2011 Oct.
Artículo en Inglés | MEDLINE | ID: mdl-27877435

RESUMEN

Combinatorial magnetron sputter deposition from elemental targets was used to create Fe-B composition spread type thin film materials libraries on thermally oxidized 4-in. Si wafers. The materials libraries consisting of wedge-type multilayer thin films were annealed at 500 or 700 °C to transform the multilayers into multiphase alloys. The libraries were characterized by nuclear reaction analysis, Rutherford backscattering, nanoindentation, vibrating sample magnetometry, x-ray diffraction (XRD) and transmission electron microscopy (TEM). Young's modulus and hardness values were related to the annealing parameters, structure and composition of the films. The magnetic properties of the films were improved by annealing in a H2 atmosphere, showing a more than tenfold decrease in the coercive field values in comparison to those of the vacuum-annealed films. The hardness values increased from 8 to 18 GPa when the annealing temperature was increased from 500 to 700 °C. The appearance of Fe2B phases, as revealed by XRD and TEM, had a significant effect on the mechanical properties of the films.

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