Electron energy distribution function by using probe method in electron cyclotron resonance multicharged ion source.

We are constructing a tandem type electron cyclotron resonance (ECR) ion source (ECRIS). High-energy electrons in ECRIS plasma affect electron energy distribution and generate multicharged ion. In this study, we measure electron energy distribution function (EEDF) of low energy region (≦100 eV) in ECRIS plasma at extremely low pressures (10(-3)-10(-5) Pa) by using cylindrical Langmuir probe. From the result, it is found that the EEDF correlates with the electron density and the temperature from the conventional probe analysis. In addition, we confirm that the tail of EEDF spreads to high energy region as the pressure rises and that there are electrons with high energy in ECR multicharged ion source plasma. The effective temperature estimated from the experimentally obtained EEDF is larger than the electron temperature obtained from the conventional method.

Enhanced production of electron cyclotron resonance plasma by exciting selective microwave mode on a large-bore electron cyclotron resonance ion source with permanent magnet.

We are constructing a tandem type ECRIS. The first stage is large-bore with cylindrically comb-shaped magnet. We optimize the ion beam current and ion saturation current by a mobile plate tuner. They change by the position of the plate tuner for 2.45 GHz, 11-13 GHz, and multi-frequencies. The peak positions of them are close to the position where the microwave mode forms standing wave between the plate tuner and the extractor. The absorbed powers are estimated for each mode. We show a new guiding principle, which the number of efficient microwave mode should be selected to fit to that of multipole of the comb-shaped magnets. We obtained the excitation of the selective modes using new mobile plate tuner to enhance ECR efficiency.

Controlling precise magnetic field configuration around electron cyclotron resonance zone for enhancing plasma parameters and beam current.

Multi-charged ion source which has wide operating conditions is required in various application fields. We have constructed tandem type ECR ion source (ECRIS); one of the features of its main stage is an additional coil for controlling magnetic field distribution around the mirror bottom precisely. Here the effect of magnetic field variation caused by the additional coil is experimentally considered in terms of plasma parameters and beam current as the first investigation of the main stage plasma. Furthermore, behavior of magnetic lines of force flowing from the ECR zone is calculated, and is compared with measurement results aiming for better understanding of interrelationship between plasma production and ion beam generation on the ECRIS.

New tandem type ion source based on electron cyclotron resonance for universal source of synthesized ion beams.

A new tandem type source has been constructed on the basis of electron cyclotron resonance (ECR) plasma for producing synthesized ion beams. We investigate feasibility and hope to realize the device which has wide range operation window in a single device to produce many kinds of ion beams based on ECR ion source (ECRIS). It is considered that ECR plasmas are necessary to be available to individual operations with different plasma parameters. Both of analysis of ion beams and investigation of plasma parameters are conducted on produced plasmas. We describe construction of the new tandem type ion source based on ECRIS with wide operation window for aiming at producing synthesized ion beams as this new source can be a universal source.

Formation of multi-charged ion beams by focusing effect of mid-electrode on electron cyclotron resonance ion source.

We are constructing a tandem type electron cyclotron resonance ion source (ECRIS) and a beam line for extracting ion beams. The ion beam is extracted from the second stage by an accel-decel extraction system with a single-hole and the ion beam current on each electrode is measured. The total ion beam current is measured by a faraday cup downstream the extraction electrodes. We measure these currents as a function of the mid-electrode potential. We also change the gap length between electrodes and perform similar measurement. The behaviors of these currents obtained experimentally against the mid-electrode potential show qualitatively good agreement with a simple theoretical consideration including sheath potential effects. The effect of mid-electrode potential is very useful for decreasing the beam loss for enhancing ion beam current extracted from ECRIS.

Dependence of ion beam current on position of mobile plate tuner in multi-frequencies microwaves electron cyclotron resonance ion source.

We are constructing a tandem-type electron cyclotron resonance ion source (ECRIS). The first stage of this can supply 2.45 GHz and 11-13 GHz microwaves to plasma chamber individually and simultaneously. We optimize the beam current I(FC) by the mobile plate tuner. The I(FC) is affected by the position of the mobile plate tuner in the chamber as like a circular cavity resonator. We aim to clarify the relation between the I(FC) and the ion saturation current in the ECRIS against the position of the mobile plate tuner. We obtained the result that the variation of the plasma density contributes largely to the variation of the I(FC) when we change the position of the mobile plate tuner.

Profiles of ion beams and plasma parameters on a multi-frequencies microwaves large bore electron cyclotron resonance ion source with permanent magnets.

In order to contribute to various applications of plasma and beams based on an electron cyclotron resonance, a new concept on magnetic field with all magnets on plasma production and confinement has been proposed with enhanced efficiency for broad and dense ion beam. The magnetic field configuration consists of a pair of comb-shaped magnet surrounding plasma chamber cylindrically. Resonance zones corresponding for 2.45 GHz and 11-13 GHz frequencies are positioned at spatially different positions. We launch simultaneously multiplex frequencies microwaves operated individually, try to control profiles of the plasma parameters and the extracted ion beams, and to measure them in detail.