Nanoimprint-induced strain engineering of two-dimensional materials.

The high stretchability of two-dimensional (2D) materials has facilitated the possibility of using external strain to manipulate their properties. Hence, strain engineering has emerged as a promising technique for tailoring the performance of 2D materials by controlling the applied elastic strain field. Although various types of strain engineering methods have been proposed, deterministic and controllable generation of the strain in 2D materials remains a challenging task. Here, we report a nanoimprint-induced strain engineering (NISE) strategy for introducing controllable periodic strain profiles on 2D materials. A three-dimensional (3D) tunable strain is generated in a molybdenum disulfide (MoS2) sheet by pressing and conforming to the topography of an imprint mold. Different strain profiles generated in MoS2 are demonstrated and verified by Raman and photoluminescence (PL) spectroscopy. The strain modulation capability of NISE is investigated by changing the imprint pressure and the patterns of the imprint molds, which enables precise control of the strain magnitudes and distributions in MoS2. Furthermore, a finite element model is developed to simulate the NISE process and reveal the straining behavior of MoS2. This deterministic and effective strain engineering technique can be easily extended to other materials and is also compatible with common semiconductor fabrication processes; therefore, it provides prospects for advances in broad nanoelectronic and optoelectronic devices.

Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure.

Functional nanostructures are exploited for a variety of cutting-edge fields including plasmonics, metasurfaces, and biosensors, just to name a few. Some applications require nanostructures with uniform feature sizes while others rely on spatially varying morphologies. However, fine manipulation of the feature size over a large area remains a substantial challenge because mainstream approaches to precise nanopatterning are based on low-throughput pixel-by-pixel processing, such as those utilizing focused beams of photons, electrons, or ions. In this work, we provide a solution toward wafer-scale, arbitrary modulation of feature size distribution by introducing a lithographic portfolio combining interference lithography (IL) and grayscale-patterned secondary exposure (SE). Employed after the high-throughput IL, a SE with patterned intensity distribution spatially modulates the dimensions of photoresist nanostructures. Based on this approach, we successfully fabricated 4-inch wafer-scale nanogratings with uniform linewidths of <5% variation, using grayscale-patterned SE to compensate for the linewidth difference caused by the Gaussian distribution of the laser beams in the IL. Besides, we also demonstrated a wafer-scale structural color painting by spatially modulating the filling ratio to achieve gradient grayscale color using SE.

Ultrasensitive Molecular Detection by Imaging of Centimeter-Scale Metasurfaces with a Deterministic Gradient Geometry.

Highly sensitive detection of trace amounts of substances is crucial for broad applications in healthcare, environmental monitoring, antiterrorism, etc., where cost effectiveness and portability are often demanded. Here, an ultrasensitive sensor is reported that can detect an angstrom-thick layer of adsorbed molecules through image acquisition and processing. The sensor features a centimeter-scale plasmonic metasurface with spatially varying geometry, where the light scattering is dependent on both the adsorbed substances and spatial locations. When illuminated with narrowband light (such as from a light emitting diode), the intensity pattern recorded on the metasurface changes with the surface-adsorbed molecules, enabling label-free, sensitive, and spectrometer-free molecular detection. The centimeter-scale size of the sensing area interfaces well with consumer-level imaging sensors on mobile devices without the need for microscopic optics and offers a high signal-to-noise ratio by leveraging the multimillion pixels for noise reduction. It is experimentally demonstrated that a single layer of Al2 O3 molecules deposited on the sensor, with a thickness of approximately one angstrom, can be detected by analyzing the images taken of the sensing chip. Furthermore, by integrating the sensor into a microfluidic setup, quantitative detection of BSA/anti-BSA immune complex formation events is demonstrated, which agrees well with the Langmuir isotherm model.

Gradient wettability induced by deterministically patterned nanostructures.

We report a large-scale surface with continuously varying wettability induced by ordered gradient nanostructures. The gradient pattern is generated from nonuniform interference lithography by utilizing the Gaussian-shaped intensity distribution of two coherent laser beams. We also develop a facile fabrication method to directly transfer a photoresist pattern into an ultraviolet (UV)-cured high-strength replication molding material, which eliminates the need for high-cost reactive ion etching and e-beam evaporation during the mold fabrication process. This facile mold is then used for the reproducible production of surfaces with gradient wettability using thermal-nanoimprint lithography (NIL). In addition, the wetting behavior of water droplets on the surface with the gradient nanostructures and therefore gradient wettability is investigated. A hybrid wetting model is proposed and theoretically captures the contact angle measurement results, shedding light on the wetting behavior of a liquid on structures patterned at the nanoscale.

Stretchable Transparent Electrodes with Solution-Processed Regular Metal Mesh for an Electroluminescent Light-Emitting Film.

We report stretchable metal-mesh transparent electrodes (TEs) with excellent electrical conductivity (<2 Ω/sq) and optical transparency (>80%) under up to 55% strain. The figures of merit on these electrodes, as defined as the ratio between electrical conductivity and optical conductivity, are among the highest reported for stretchable TEs under moderate stretching. Moreover, we demonstrate their application in a stretchable electroluminescent (EL) light-emitting film as top and bottom electrodes. EL lighting devices require low-resistance electrodes to unleash their potential for large-area low-power-consumption applications, in which our highly conductive and transparent stretchable TEs provide an edge on other competitor approaches. Importantly, our stretchable metal-mesh electrodes are fabricated through a vacuum-free solution-processed approach that is scalable for cost-effective mass production. We also investigate the fracture and fatigue mechanisms of stretchable metal-mesh electrodes with various mesh patterns and observe different behaviors under one-time and cyclic stretching conditions. Our solution-processed fabrication method, failure mechanism investigation, and device demonstration for metal-mesh stretchable TEs will facilitate the adoption of this promising high-performance approach in stretchable and wearable electronics applications.

Wafer-scale nanopatterning using fast-reconfigurable and actively-stabilized two-beam fiber-optic interference lithography.

A fast-reconfigurable and actively-stabilized fiber-optic interference lithography system is demonstrated in this paper. Employment of fiber-optic components greatly enhances the flexibility of the whole system, simplifies its optical alignment, and suppresses the interference of mechanical vibrations. Active stabilization is implemented in the system and evaluated through modeling and experiment. We demonstrate 3-inch-diameter wafer-scale patterning of 240-nm-period grating lines with a sub-50-nm linewidth and an aspect ratio over 3. Two-dimensional patterns of different geometries and dimensions are also demonstrated to show the versatility of our system. Step-and-repeat exposure is demonstrated with independently controlled patterning fields of 2×2cm2 large.

Highly transparent and flexible polyaniline mesh sensor for chemiresistive sensing of ammonia gas.

A new structure of a flexible, transparent polyaniline (PANI) ammonia gas sensor is reported. The sensor features a hierarchical nanostructured PANI polymer arranged in a micromesh, exhibiting excellent chemiresistive sensitivity to ammonia gas and near-neutral color transparency. The PANI mesh is embedded in a flexible substrate and therefore exhibits superior mechanical stability against peeling and bending. These merits make it a promising candidate for application in wearable electronics. Moreover, the PANI mesh sensor is fabricated through a cost-effective, solution-based strategy that enables vacuum-free fabrication of a sacrificial catalytic copper mesh followed by in situ polymerization, and this strategy is scalable for high-volume production. We demonstrate the high-performance resistive sensing of ammonia gas with concentrations from 2.5 ppb to 100 ppm using this flexible PANI mesh sensor with an excellent transparency of 88.4% at 600 nm wavelength. Furthermore, no significant degradation in the sensing performance occurs after 1000 bending cycles.