RESUMEN
Self-organized growth of well-ordered endotaxial silicide nanowires (NWs) on clean Si(110) surfaces has been investigated by in situ scanning tunneling microscopy (STM) and transmission electron microscopy (TEM). Co deposition on clean Si(110) reconstructed surfaces at â¼600 °C produces unidirectional CoSi2 NWs by reaction of cobalt with the hot silicon substrate. STM investigations reveal four major types of distinct NWs, all growing along the [-110] in-plane direction except one type growing along the in-plane [-113] direction. There are also some nanodots. The cross-sectional TEM measurements show that the unidirectional NWs are of two types-flat-top and ridged. The NWs grow not only on the substrate but also into the substrate. CoSi2 in flat top NWs are in the same crystallographic orientation as the substrate Si and the buried interfaces between CoSi2 and Si are A-type. In the ridged NWs CoSi2 and Si are in different crystallographic orientations and the interfaces are B-type. The ridged NWs are in general wider and grow deeper into the substrate.
RESUMEN
Roughening in the electronic growth of Ag films on Si(111)-(7×7) surfaces for a film thickness ranging from 1 to 30 monolayers is reported. Ag films exhibit the growth of flat-top plateaus of preferential heights due quantum electronic effect. We have observed roughening of the film growth due to instability with linear diffusion characterized by the ln(θ)(1/2) dependence of the local surface slope, where θ is the Ag coverage. The roughening of the surface morphology has been characterized by scaling exponents α, ß and 1/z, which are determined using scanning tunneling microscopy. Increased value of α = 0.67 ± 0.04 at the early stage of the electronic growth with two atomic layer height flat-top isolated Ag mounds to 0.77 ± 0.06 at the later stage of the growth when isolated mounds coalesce and form percolated structures maintaining preferential heights of an even number of atomic layers in the Ag mounds indicates the instability in the electronic growth. As a result, interface width W increases as a power law of coverage (θ), W ⼠θ(ß), with growth exponent ß = 0.33 ± 0.03, and lateral correlation length ξ grows as ξ ⼠θ(1/z) with 1/z = 0.27 ± 0.05.
