Resonant photoemission spectroscopy of atomic layer Fe2N on Cu(111) with continuous angular rotation of linearly polarized light.

Linearly polarized soft x-rays provide information about electronic or magnetic anisotropy through absorption into materials or generation of photoelectrons. In order to change the relative angle between linear polarization and sample crystalline axes, either x-ray polarization or the sample needs to be rotated. Due to difficulties of polarization control in the soft x-ray range, a conventional approach was to rotate the sample. However, this method is not compatible, for example, withoperandomeasurements on non-uniform samples where sample size and rotational motion are severely restricted. At BL07LSU of SPring-8, we developed a new method to rotate the linear polarization angle using a segmented cross undulator. We report an application of this linear polarization rotation to resonant photoemission spectroscopy on an magnetic atomic layer Fe2N on Cu(111) to probe the electronic anisotropy of the 3dstates in the vicinity of the Fermi level.

Synchrotron Radiation Lithography for Manufacturing Integrated Circuits Beyond 100 nm.

Extreme ultraviolet lithography is a powerful tool for printing features of 0.1 micro m and below; in Japan and the USA there is a growing tendency to view it as the wave of the future. With Schwarzschild optics, replication of a 0.05 micro m pattern has been demonstrated in a 25 micro m square area. With a two-aspherical-mirror system, a 0.15 micro m pattern has been replicated in a ring slit area of 20 mm x 0.4 mm; a combination of this system with illumination optics and synchronized mask and wafer stages has enabled the replication of a 0.15 micro m pattern in an area of 10 mm x 12.5 mm. Furthermore, in the USA, the Sandia National Laboratory has succeeded in fabricating a fully operational NMOS transistor with a gate length of 0.1 micro m. The most challenging problem is the fabrication of mirrors with the required figure error of 0.28 nm. However, owing to advances in measurement technology, mirrors can now be made to a precision that almost satisfies this requirement. Therefore, it is time to move into a rapid development phase in order to obtain a system ready for practical use by the year 2004. In this paper the status of individual technologies is discussed in light of this situation, and future requirements for developing a practical system are considered.

Isochronous storage ring of the New SUBARU project.

The aims of the New SUBARU project are to promote industrial applications in the VUV and soft X-ray region and to develop research and development towards new light sources. The main facility of the New SUBARU project is the 1.5 GeV electron storage ring which is under construction at the SPring-8 site in Harima Science Garden City, Japan. The storage ring is quasi-isochronous and has variable momentum dispersion for the deep study of beam dynamics in very short bunches.

Fabrication of Mo/Al multilayer films for a wavelength of 18.5 nm.

This paper reports the fabrication and evaluation of Mo/Al and Mo/Si multilayer films (MLs) for a wavelength of 18.5 nm. Calculated reflectivities of Mo/Al MLs at an incident angle of 10 degrees were about 7% higher than those of Mo/Si MLs. MLs were fabricated using an RF-magnetron sputtering deposition system. The measured reflectivity of Mo/Al MLs was 33.5%. The cause of the decreasing reflectivity was supposed to be the surface and interfacial roughness. In the surface observation utilizing atomic force microscopy, the surface roughness of Mo/Al MLs was dominated by the Al layer. Therefore, the conditions for fabricating Al films were optimized.

Design of beamline optics for EUVL.

The design of front-end collimating optics for extreme-ultraviolet lithography (EUVL) is reported. For EUVL, collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror can achieve shorter optical path lengths than collimating optics consisting of two concave toroidal mirrors. Collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror are discussed. The design of collimating optics for EUVL beamlines based on ray-tracing studies is described.

Subnanosecond In-Line Soft X-Ray Holography Using Germanium Laser in the 20 nm Wavelength Region.

Near- and far-field characteristics of a germanium soft x-ray laser at the wavelengths of 23.2-23.6 nm (J = 2-1 transitions) and 19.6 nm (J = 0-1 transition) are given for quantitative evaluation of the germanium laser for holographic applications. In-line Gabor holography of simple structured objects, such as thin opaque fibers and a standard electron microscope test specimen, is demonstrated. The holograms were recorded on PMMA (polymethyl methacrylate) photoresists and llford Q-plates. The holograms recorded on PMMA were retrieved with an atomic force microscope. The object image was reconstructed by numerical reconstruction with phase retrieval algorithm, resulting in a clear, ghost-free image with sharp edges which infer sub-µm resolution. Future directions for x-ray laser holography are briefly discussed.