RESUMEN
Herein, the adsorption of polystyrene (PS) on phenyl-modified SiO2-Si substrates was investigated. Different from those for PS adsorption on a neat SiO2-Si substrate, the growth rate (vads) in the linear regime and hads/Rg (hads, thickness of flattened and loosely adsorbed layers on the substrate; Rg, radius of gyration) declined with increasing molecular weight (Mw) of PS and the phenyl content on the modified substrates, while the thickness of the flattened layer (hflat) and its coverage increased with increasing phenyl content. The results indicated that the adsorption of loose chains was controlled by the adsorption of flattened chains, as it only occurred in the empty contact sites remaining after the adsorption of flattened chains. Before approaching quasi-equilibrium (t < tcross), the number of flattened chain contact sites increased due to an enthalpically favorable process and, correspondingly, their spatial positions dynamically changed, which perturbed the adsorption of loose chains. When the adsorption of flattened chains reached quasi-equilibrium (t > tcross), the adsorption of loose chains was determined by the empty contact sites. The coverage of flattened chains and time to reach quasi-equilibrium were increased with more phenyl groups on the substrate, enhancing π-π interfacial interactions and resulting in a decreased adsorption rate and fewer loosely adsorbed chains. Mw-dependent vads and hads/Rg differed on phenyl-modified substrates compared to the neat SiO2-Si substrate owing to fewer empty contact sites for loose chains. The study findings improve our understanding of the mechanism responsible for the formation and structure of the adsorbed layer on solid surfaces.
RESUMEN
Herein, the desorption of the adsorbed chains (including two regions of flattened chains and loosely adsorbed chains) was examined by monitoring the chain exchange kinetics between the adsorbed chains and the top-free chains in a bilayer system by using fluorine-labeled polystyrene (PS). The results indicated that the exchange behavior of PS-flattened chains with the top-free chains is much slower than that of PS-loose chains and has a strong molecular weight (MW) dependence. Interestingly, in the presence of loosely adsorbed chains, the desorption of flattened chains was accelerated greatly and had weaker MW dependency. We attribute the MW-dependent desorption phenomena to the average number of contact sites between polymer adsorbed chains and the substrate, which rapidly increased with increasing MW. Likewise, the desorption of loosely adsorbed chains may provide extra conformational energy to accelerate the desorption of flattened chains.
RESUMEN
The adsorbed layer on a solid surface plays a crucial role in the dynamics of nanoconfinement polymer materials. However, the influence of the adsorbed layer is complex, and clarifying this influence on the dynamics of confined polymers remains a major challenge. In this paper, SiO2-Si substrates with various thicknesses and adsorbed layers of PS with various molecular weights were used to reveal the effect of the adsorbed layer on the corresponding segmental dynamics of the supported thin PS films. Strongly suppressed segmental dynamics of thin PS films were observed for the films supported on thicker adsorbed layers or prepared using higher molecular weight. Neutron reflectivity revealed that the overlap region thickness between the adsorbed layer and the top overlayer increased with increasing thickness and molecular weight of the adsorbed layer, both of which correlate well with the distance over which the polystyrene dynamics were depressed by the adsorbed layer. The results show that the influencing distance of the adsorbed layer is related to the overlap zone formed between the adsorption layer and the upper thin film. The effect of the adsorbed layer molecular weight can be ascribed to the fact that large loops and long tails in the adsorbed layer result in stronger interpenetrations and entanglements between polymer chains in the adsorbed layer and in the overlayer, causing a stronger substrate effect and suppression of the segment dynamics of the supported thin PS films.
