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Relative measurements of second-order susceptibility with reflective second-harmonic generation.
Flueraru, Costel; Grover, Chander P.
Afiliación
  • Flueraru C; Institute for National Measurement Standards, National Research Council Canada, 1200 Montreal Road, Ottawa, Ontario K1A 0R6, Canada. costel.flueraru@nrc.ca
Appl Opt ; 42(33): 6666-71, 2003 Nov 20.
Article en En | MEDLINE | ID: mdl-14658470
ABSTRACT
There is a strong demand for a simple and reliable technique for second-order susceptibility measurements of thin films. Since the Maker fringe technique is limited to transparent substrates we propose an experimental protocol based on reflective second-harmonic generation (SHG). The proposed protocol is based on relative measurements of Z-cut quartz. An analytical expression of the reflective SHG intensity dependence of the polarizer, analyzer, and sample azimuth is presented. An error analysis is also presented. Thin organic film of the side-chain polymer poly(Disperse Red 1 Methacrylate-Co-Methyl-Methacrylate) is investigated. Results for different wavelengths are reported.
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Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Appl Opt Año: 2003 Tipo del documento: Article País de afiliación: Canadá
Buscar en Google
Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Appl Opt Año: 2003 Tipo del documento: Article País de afiliación: Canadá
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