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Buried Ni/Cu(001) interface at the atomic scale.
Meyerheim, H L; Sander, D; Negulyaev, N N; Stepanyuk, V S; Popescu, R; Popa, I; Kirschner, J.
Afiliación
  • Meyerheim HL; Max-Planck-Institut für Mikrostrukturphysik, Weinberg 2, D-06120 Halle, Germany. hmeyerhm@mpi-halle.mpg.de
Phys Rev Lett ; 100(14): 146101, 2008 Apr 11.
Article en En | MEDLINE | ID: mdl-18518052
ABSTRACT
We present a quantitative surface x-ray analysis of the buried Ni/Cu(001) interface structure after deposition of 3 and 5 monolayers of Ni at room temperature. Interface mixing is found where 27+/-10% of top layer Cu atoms are exchanged by Ni. Atomic scale simulations reveal a kinetic pathway for the Ni/Cu-exchange process and explain the observed limited degree of intermixing. A disperse distribution of Ni within the Cu surface with a preferential Ni-Ni separation of 3-4 nearest neighbor distances is determined.
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Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Phys Rev Lett Año: 2008 Tipo del documento: Article País de afiliación: Alemania
Buscar en Google
Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Phys Rev Lett Año: 2008 Tipo del documento: Article País de afiliación: Alemania
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