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Piezoresistance in silicon at uniaxial compressive stresses up to 3 GPa.
Milne, J S; Favorskiy, I; Rowe, A C H; Arscott, S; Renner, Ch.
Afiliación
  • Milne JS; Physique de la Matière Condensée, Ecole Polytechnique, CNRS, 91128 Palaiseau, France.
Phys Rev Lett ; 108(25): 256801, 2012 Jun 22.
Article en En | MEDLINE | ID: mdl-23004630
ABSTRACT
The room-temperature longitudinal piezoresistance of n-type and p-type crystalline silicon along selected crystal axes is investigated under uniaxial compressive stresses up to 3 GPa. While the conductance (G) of n-type silicon eventually saturates at ≈ 45% of its zero-stress value (G(0)) in accordance with the charge transfer model, in p-type material G/G(0) increases above a predicted limit of ≈ 4.5 without any significant saturation, even at 3 GPa. Calculation of G/G(0) using ab initio density functional theory reveals that neither G nor the mobility, when properly averaged over the hole distribution, saturate at stresses lower than 3 GPa. The lack of saturation has important consequences for strained-silicon technologies.
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Colección: 01-internacional Base de datos: MEDLINE Tipo de estudio: Prognostic_studies Idioma: En Revista: Phys Rev Lett Año: 2012 Tipo del documento: Article País de afiliación: Francia
Buscar en Google
Colección: 01-internacional Base de datos: MEDLINE Tipo de estudio: Prognostic_studies Idioma: En Revista: Phys Rev Lett Año: 2012 Tipo del documento: Article País de afiliación: Francia
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