Polymer peel-off mask for high-resolution surface derivatization, neuron placement and guidance.
Biotechnol Bioeng
; 110(8): 2236-41, 2013 Aug.
Article
en En
| MEDLINE
| ID: mdl-23456575
ABSTRACT
We present a dry lift-off method using a chemically resistant spin-on plastic, polyimide, to pattern surfaces with high accuracy and resolution. Using well-known lithographic and reactive ion etching techniques, the spin-on polymer is patterned over a silicon dioxide surface. The plastic efficiently adheres to the silicon dioxide surface during the chemical modification and is readily lifted-off following the derivatization process, permitting highly reliable surface derivatization. The verticality of the reactive ion etch enables sub-micrometer features to be patterned, down to 0.8 µm. The technique is used to pattern neurons on silicon dioxide surfaces efficient neuron placement over a 4 mm area is shown for patterns larger than 50 µm while process guidance is shown for 10 µm patterns.
Texto completo:
1
Colección:
01-internacional
Base de datos:
MEDLINE
Asunto principal:
Resinas Sintéticas
/
Técnicas de Cultivo de Célula
/
Materiales Biocompatibles Revestidos
/
Neuronas
Tipo de estudio:
Guideline
Límite:
Animals
Idioma:
En
Revista:
Biotechnol Bioeng
Año:
2013
Tipo del documento:
Article
País de afiliación:
Canadá