Incorporation and redistribution of impurities into silicon nanowires during metal-particle-assisted growth.

Chen, Wanghua; Yu, Linwei; Misra, Soumyadeep; Fan, Zheng; Pareige, Philippe; Patriarche, Gilles; Bouchoule, Sophie; Roca i Cabarrocas, Pere

Chen, Wanghua; Yu, Linwei; Misra, Soumyadeep; Fan, Zheng; Pareige, Philippe; Patriarche, Gilles; Bouchoule, Sophie; Roca i Cabarrocas, Pere.

Afiliación

Chen W; LPICM, CNRS, Ecole Polytechnique, Palaiseau 91128, France.
Yu L; 1] LPICM, CNRS, Ecole Polytechnique, Palaiseau 91128, France [2] School of Electronics Science and Engineering, Nanjing University, Nanjing 210093, China.
Misra S; LPICM, CNRS, Ecole Polytechnique, Palaiseau 91128, France.
Fan Z; LPICM, CNRS, Ecole Polytechnique, Palaiseau 91128, France.
Pareige P; GPM, CNRS, Université et INSA de Rouen, Saint Etienne du Rouvray 76801, France.
Patriarche G; LPN, CNRS, Marcoussis 91406, France.
Bouchoule S; LPN, CNRS, Marcoussis 91406, France.
Roca i Cabarrocas P; LPICM, CNRS, Ecole Polytechnique, Palaiseau 91128, France.

Nat Commun ; 5: 4134, 2014 Jun 12.

Article en En | MEDLINE | ID: mdl-24920212

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nat Commun Asunto de la revista: BIOLOGIA / CIENCIA Año: 2014 Tipo del documento: Article País de afiliación: Francia

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