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Epitaxial graphene/Ge interfaces: a minireview.
Dedkov, Yuriy; Voloshina, Elena.
Afiliación
  • Dedkov Y; Department of Physics, Shanghai University, 200444 Shanghai, P. R. China. dedkov@shu.edu.cn voloshina@shu.edu.cn and Institute of Physical and Organic Chemistry, Southern Federal University, 344090 Rostov on Don, Russia.
  • Voloshina E; Department of Physics, Shanghai University, 200444 Shanghai, P. R. China. dedkov@shu.edu.cn voloshina@shu.edu.cn and Institute of Physical and Organic Chemistry, Southern Federal University, 344090 Rostov on Don, Russia.
Nanoscale ; 12(21): 11416-11426, 2020 Jun 04.
Article en En | MEDLINE | ID: mdl-32458957
ABSTRACT
The recent discovery of the ability to perform direct epitaxial growth of graphene layers on semiconductor Ge surfaces led to a huge interest in this topic. One of the reasons for this interest is the chance to overcome several present-day drawbacks on the method of graphene integration in modern semiconductor technology. The other one is connected with the fundamental studies of the new graphene-semiconductor interfaces that might help with the deeper understanding of mechanisms, which governs graphene growth on different substrates as well as shedding light on the interaction of graphene with these substrates, whose range is now spread from metals to insulators. The present minireview gives a timely overview of the state-of-the-art field of studies of the graphene-Ge epitaxial interfaces and draws some conclusions in this research area.

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nanoscale Año: 2020 Tipo del documento: Article País de afiliación: Rusia

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nanoscale Año: 2020 Tipo del documento: Article País de afiliación: Rusia
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