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Engineering a Robust Flat Band in III-V Semiconductor Heterostructures.
Franchina Vergel, Nathali A; Post, L Christiaan; Sciacca, Davide; Berthe, Maxime; Vaurette, François; Lambert, Yannick; Yarekha, Dmitri; Troadec, David; Coinon, Christophe; Fleury, Guillaume; Patriarche, Gilles; Xu, Tao; Desplanque, Ludovic; Wallart, Xavier; Vanmaekelbergh, Daniel; Delerue, Christophe; Grandidier, Bruno.
Afiliación
  • Franchina Vergel NA; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Post LC; Debye Institute for Nanomaterials Science, Utrecht University, 3508 TA Utrecht, The Netherlands.
  • Sciacca D; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Berthe M; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Vaurette F; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Lambert Y; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Yarekha D; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Troadec D; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Coinon C; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Fleury G; Univ. Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France.
  • Patriarche G; CNRS, Centre de Nanosciences et de Nanotechnologies (C2N), University Paris-Saclay, 91120 Palaiseau, France.
  • Xu T; Sino-European School of Technology, Shanghai University, 200444 Shanghai, China.
  • Desplanque L; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Wallart X; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Vanmaekelbergh D; Debye Institute for Nanomaterials Science, Utrecht University, 3508 TA Utrecht, The Netherlands.
  • Delerue C; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
  • Grandidier B; Univ. Lille, CNRS, Centrale Lille, Univ. Polytechnique Hauts-de-France, Junia-ISEN, UMR 8520 - IEMN, 59000 Lille, France.
Nano Lett ; 21(1): 680-685, 2021 Jan 13.
Article en En | MEDLINE | ID: mdl-33337891
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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nano Lett Año: 2021 Tipo del documento: Article País de afiliación: Francia
Texto completo
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PubMed Links
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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nano Lett Año: 2021 Tipo del documento: Article País de afiliación: Francia