Your browser doesn't support javascript.
loading
The Nanolithography Toolbox.
Balram, Krishna C; Westly, Daron A; Davanço, Marcelo; Grutter, Karen E; Li, Qing; Michels, Thomas; Ray, Christopher H; Yu, Liya; Kasica, Richard J; Wallin, Christopher B; Gilbert, Ian J; Bryce, Brian A; Simelgor, Gregory; Topolancik, Juraj; Lobontiu, Nicolae; Liu, Yuxiang; Neuzil, Pavel; Svatos, Vojtech; Dill, Kristen A; Bertrand, Neal A; Metzler, Meredith G; Lopez, Gerald; Czaplewski, David A; Ocola, Leonidas; Srinivasan, Kartik A; Stavis, Samuel M; Aksyuk, Vladimir A; Liddle, J Alexander; Krylov, Slava; Ilic, B Robert.
Afiliación
  • Balram KC; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Westly DA; University of Maryland, Maryland NanoCenter, College Park, MD 20740 USA.
  • Davanço M; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Grutter KE; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Li Q; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Michels T; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Ray CH; University of Maryland, Maryland NanoCenter, College Park, MD 20740 USA.
  • Yu L; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Kasica RJ; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Wallin CB; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Gilbert IJ; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Bryce BA; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Simelgor G; University of Maryland, Maryland NanoCenter, College Park, MD 20740 USA.
  • Topolancik J; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Lobontiu N; University of Maryland, Maryland NanoCenter, College Park, MD 20740 USA.
  • Liu Y; Harvey Mudd College, Claremont, CA 91711 USA.
  • Neuzil P; Edico Genome, La Jolla, CA 92037 USA.
  • Svatos V; Roche Sequencing Solutions, Pleasanton, CA 94588 USA.
  • Dill KA; University of Alaska, Mechanical Engineering, Anchorage, AK 99508 USA.
  • Bertrand NA; Worcester Polytechnic Institute, Mechanical Engineering, Worcester, MA 01609 USA.
  • Metzler MG; Brno University of Technology (BUT), Central European Institute of Technology (CEITEC), Technicka 3058/10, CZ-616 00 Brno, Czech Republic.
  • Lopez G; Department of Microsystems, Northwestern Polytechnical University, Xi'an, P.R. China.
  • Czaplewski DA; Brno University of Technology (BUT), Central European Institute of Technology (CEITEC), Technicka 3058/10, CZ-616 00 Brno, Czech Republic.
  • Ocola L; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Srinivasan KA; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
  • Stavis SM; Quattrone Nanofabrication Facility, University of Pennsylvania, Philadelphia, PA 19104 USA.
  • Aksyuk VA; Quattrone Nanofabrication Facility, University of Pennsylvania, Philadelphia, PA 19104 USA.
  • Liddle JA; Center for Nanoscale Materials, Argonne National Laboratory, Lemont, IL 60439 USA.
  • Krylov S; Center for Nanoscale Materials, Argonne National Laboratory, Lemont, IL 60439 USA.
  • Ilic BR; National Institute of Standards and Technology, Gaithersburg, MD 20899 USA.
J Res Natl Inst Stand Technol ; 121: 464-475, 2016.
Article en En | MEDLINE | ID: mdl-34434635
ABSTRACT
This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST) developed the Nanolithography Toolbox to help users of the CNST NanoFab design devices with complex curves and aggressive critical dimensions. Using parameterized shapes as building blocks, the Nanolithography Toolbox allows users to rapidly design and layout nanoscale devices of arbitrary complexity through scripting and programming. The Toolbox offers many parameterized shapes, including structure libraries for micro- and nanoelectromechanical systems (MEMS and NEMS) and nanophotonic devices. Furthermore, the Toolbox allows users to precisely define the number of vertices for each shape or create vectorized shapes using Bezier curves. Parameterized control allows users to design smooth curves with complex shapes. The Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.
Palabras clave
Texto completo
Añadir a Mi BVS
Imprimir
XML
PubMed Links
Buscar en Google

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: J Res Natl Inst Stand Technol Año: 2016 Tipo del documento: Article
Texto completo
Añadir a Mi BVS
Imprimir
XML
PubMed Links
Buscar en Google

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: J Res Natl Inst Stand Technol Año: 2016 Tipo del documento: Article