Process temperature-dependent interface quality and Maxwell-Wagner interfacial polarization in atomic layer deposited Al2O3/TiO2 nanolaminates for energy storage applications.

Padhi, Partha Sarathi; Ajimsha, R S; Rai, S K; Goutam, U K; Bose, Aniruddha; Bhartiya, Sushmita; Misra, Pankaj

Process temperature-dependent interface quality and Maxwell-Wagner interfacial polarization in atomic layer deposited Al₂O₃/TiO₂ nanolaminates for energy storage applications.

Padhi, Partha Sarathi; Ajimsha, R S; Rai, S K; Goutam, U K; Bose, Aniruddha; Bhartiya, Sushmita; Misra, Pankaj.

Afiliación

Padhi PS; Oxide Nano Electronics Lab., Laser Materials Processing Division, Raja Ramanna Centre for Advanced Technology, Indore 452013, India. partha.rrcat@gmail.com.
Ajimsha RS; Homi Bhabha National Institute, Training School Complex, Anushakti Nagar, Mumbai 400094, India.
Rai SK; Oxide Nano Electronics Lab., Laser Materials Processing Division, Raja Ramanna Centre for Advanced Technology, Indore 452013, India. partha.rrcat@gmail.com.
Goutam UK; Homi Bhabha National Institute, Training School Complex, Anushakti Nagar, Mumbai 400094, India.
Bose A; Accelerator Physics and Synchrotrons Utilization Division, Raja Ramanna Centre for Advanced Technology, Indore 452013, India.
Bhartiya S; Technical Physics Division, Bhabha Atomic Research Centre, Trombay, Mumbai, India.
Misra P; SCRF Cavity Characterization and Cryogenics Section, Raja Ramanna Centre for Advanced Technology, Indore 452013, India.

Nanoscale ; 15(18): 8337-8355, 2023 May 11.

Article en En | MEDLINE | ID: mdl-37092181

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nanoscale Año: 2023 Tipo del documento: Article País de afiliación: India