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Plasma Enhanced Atomic Layer Deposition of Silicon Nitride for Two Different Aminosilane Precursors Using Very High Frequency (162 MHz) Plasma Source.
Ji, You Jin; Kim, Hae In; Choi, Seung Yup; Kang, Ji Eun; Ellingboe, Albert Rogers; Chandra, Haripin; Lee, Chang-Won; Yeom, Geun Young.
Afiliación
  • Ji YJ; School of Advanced Materials Science and Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea.
  • Kim HI; School of Advanced Materials Science and Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea.
  • Choi SY; School of Advanced Materials Science and Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea.
  • Kang JE; School of Advanced Materials Science and Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea.
  • Ellingboe AR; School of Advanced Materials Science and Engineering, Sungkyunkwan University, 2066 Seobu-ro, Jangan-gu, Suwon-si, Gyeonggi-do 16419, Republic of Korea.
  • Chandra H; Plasma Research Laboratory, School of Physical Sciences and NCPST, Dublin City University, Dublin D9, Ireland.
  • Lee CW; EMD Electronics, 1969 Palomar Oaks Way, Carlsbad, California 92011, United States.
  • Yeom GY; Merck Korea, Jangjagol-ro 82, Danwon-gu, Ansan-si, Gyeonggi-do 15601, Republic of Korea.
ACS Appl Mater Interfaces ; 15(23): 28763-28771, 2023 Jun 14.
Article en En | MEDLINE | ID: mdl-37269552
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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Asunto de la revista: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Año: 2023 Tipo del documento: Article
Texto completo
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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Asunto de la revista: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Año: 2023 Tipo del documento: Article