Predictive Maintenance of Pins in the ECD Equipment for Cu Deposition in the Semiconductor Industry.

Amato, Umberto; Antoniadis, Anestis; De Feis, Italia; Fazio, Domenico; Genua, Caterina; Gijbels, Irène; Granata, Donatella; La Magna, Antonino; Pagano, Daniele; Tochino, Gabriele; Vasquez, Patrizia

Amato, Umberto; Antoniadis, Anestis; De Feis, Italia; Fazio, Domenico; Genua, Caterina; Gijbels, Irène; Granata, Donatella; La Magna, Antonino; Pagano, Daniele; Tochino, Gabriele; Vasquez, Patrizia.

Afiliación

Amato U; Institute of Applied Sciences and Intelligent Systems, National Research Council of Italy, 80131 Naples, Italy.
Antoniadis A; Institute of Applied Sciences and Intelligent Systems, National Research Council of Italy, 80131 Naples, Italy.
De Feis I; Institute of Applied Calculus, National Research Council of Italy, 80131 Naples, Italy.
Fazio D; STMicroelectronics, Catania Wafer Fab Operations, 95121 Catania, Italy.
Genua C; STMicroelectronics, Catania Wafer Fab Operations, 95121 Catania, Italy.
Gijbels I; Department of Mathematics, Katholieke Universiteit Leuven, 3001 Leuven, Belgium.
Granata D; Institute of Applied Calculus, National Research Council of Italy, 00185 Rome, Italy.
La Magna A; Institute of Microelectronics and Microsystems, National Research Council of Italy, 95121 Catania, Italy.
Pagano D; STMicroelectronics, Catania Wafer Fab Operations, 95121 Catania, Italy.
Tochino G; STMicroelectronics, Catania Wafer Fab Operations, 95121 Catania, Italy.
Vasquez P; STMicroelectronics, Catania Wafer Fab Operations, 95121 Catania, Italy.

Sensors (Basel) ; 23(14)2023 Jul 08.

Article en En | MEDLINE | ID: mdl-37514544

Palabras clave

Predictive Maintenance; image processing; optical sensor; semiconductors

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Tipo de estudio: Prognostic_studies / Risk_factors_studies Idioma: En Revista: Sensors (Basel) Año: 2023 Tipo del documento: Article País de afiliación: Italia

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