Synthesis of Well-Ordered Functionalized Silicon Microwires Using Displacement Talbot Lithography for Photocatalysis.
ACS Omega
; 9(18): 20623-20628, 2024 May 07.
Article
en En
| MEDLINE
| ID: mdl-38737027
ABSTRACT
Metal-assisted chemical etching (MACE) is a cheap and scalable method that is commonly used to obtain silicon nano- or microwires but lacks spatial control. Herein, we present a synthesis method for producing vertical and highly periodic silicon microwires, using displacement Talbot lithography before wet etching with MACE. The functionalized periodic silicon microwires show 65% higher PEC performance and 2.3 mA/cm2 higher net photocurrent at 0 V compared to functionalized, randomly distributed microwires obtained by conventional MACE at the same potentials.
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01-internacional
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MEDLINE
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En
Revista:
ACS Omega
Año:
2024
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Article
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Suecia