Approaching the resolution limit of nanometer-scale electron beam-induced deposition.
Nano Lett
; 5(7): 1303-7, 2005 Jul.
Article
em En
| MEDLINE
| ID: mdl-16178228
ABSTRACT
We report the writing of very high resolution tungsten containing dots in regular arrays by electron beam-induced deposition (EBID). The size averaged over 100 dots was 1.0 nm at fwhm. Because of the statistical spread in the dot size, large and small dots are present in the arrays, with the smallest having a diameter of only 0.7 nm at fwhm. To date these are the smallest features fabricated by EBID. We have also fabricated lines with the smallest having a width at fwhm of 1.9 nm and a spacing of 3.2 nm.
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Coleções:
01-internacional
Base de dados:
MEDLINE
Assunto principal:
Tungstênio
/
Cristalização
/
Nanotecnologia
/
Nanoestruturas
/
Elétrons
Tipo de estudo:
Evaluation_studies
Idioma:
En
Revista:
Nano Lett
Ano de publicação:
2005
Tipo de documento:
Article
País de afiliação:
Holanda