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Mechanism of strain-influenced quantum well thickness reduction in GaN/AlN short-period superlattices.
Kuchuk, A V; Kladko, V P; Petrenko, T L; Bryksa, V P; Belyaev, A E; Mazur, Yu I; Ware, M E; DeCuir, E A; Salamo, G J.
Afiliação
  • Kuchuk AV; Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, Prospect Nauky 45, Kyiv 03028, Ukraine. Institute for Nanoscience & Engineering, University of Arkansas, 731W. Dickson St., Fayetteville, AR 72701, USA.
Nanotechnology ; 25(24): 245602, 2014 Jun 20.
Article em En | MEDLINE | ID: mdl-24869600
ABSTRACT
We report on the mechanism of strain-influenced quantum well (QW) thickness reduction in GaN/AlN short-period superlattices grown by plasma-assisted molecular beam epitaxy. Density functional theory was used to support the idea of a thermally activated exchange mechanism between Al adatoms and Ga surface atoms that is influenced by the strain state of the GaN QWs. These ab initio calculations support our experimentally observed reduction in QW thickness for different intrinsic strains.

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanotechnology Ano de publicação: 2014 Tipo de documento: Article País de afiliação: Estados Unidos

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanotechnology Ano de publicação: 2014 Tipo de documento: Article País de afiliação: Estados Unidos
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