The effect of location/site on polished human enamel after mechanical and chemical wear.

ABSTRACT

OBJECTIVE: To compare profilometry and microhardness of polished occlusal and buccal human enamel following a mechanical and chemical wear regime. METHODS: Enamel from polished human molars were sectioned into buccal and occlusal surfaces and randomly allocated into two groups (n = 10) and then exposed to 0.3 % citric acid at pH 2.7 for 10, 20, 40 and 60 mins each followed by abrasion with non-fluoridated toothpaste for 240 strokes in a reciprocating brushing machine. A white light profilometer with a spot size of 12 um measured mean step-height following each cycle. Microhardness indentations were conducted following the final cycled 60 mins erosion/abrasion using 0.01, 0.02, 0.1, 0.5 and 2.5 kgf indentation load. Statistical disparity were evaluated using a two-way ANOVA and post-hoc Sidak's multiple comparisons tests at α = 0.05. RESULTS: After erosion/abrasion, the mean (SD) step-heights on occlusal and buccal surfaces were not significantly different until 60 mins, when occlusal surfaces exhibited greater step-heights, 32.9 µm (2.8) and 31.1 µm (1.8) and p = 0.02, respectively. Buccal and occlusal microhardness was statistically lower following erosion/abrasion at loads of 0.01 kgf (p = 0.0005) and 0.02 kgf (p = 0.0006) but no significant differences were observed in the microhardness between the surfaces at any loads. CONCLUSION: The occlusal and buccal surfaces were not statistically different for microhardness or step height suggesting the susceptibility to wear is not related to the anatomy and structure of the tooth and is more likely related to other factors such as the environment. CLINICAL SIGNIFICANCE: The study emphasizes that a notable difference in wear between occlusal and buccal enamel surfaces emerges only after prolonged exposure to simultaneous chemical and mechanical stress. This finding necessitates a preventive dental approach that accounts for both the duration of exposure and environmental factors.