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Investigation of Grain Boundary Effects in Sm0.2Ce0.8O2-x Thin Film Memristors.
Shi, Weikai; Wang, Luyao; Yang, Nan.
Afiliação
  • Shi W; School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China.
  • Wang L; School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China.
  • Yang N; School of Physical Science and Technology, ShanghaiTech University, Shanghai 201210, China.
Materials (Basel) ; 17(13)2024 Jul 08.
Article em En | MEDLINE | ID: mdl-38998440
ABSTRACT
Cerium-based materials (CeO2-x) are of significant interest in the development of vacancy-modulated resistive switching (RS) memory devices. However, the influence of grain boundaries on the performance of memristors is very limited. To fill this gap, this study explores the influence of grain boundaries in cerium-based thin film resistive random-access memory (RRAM) devices. Sm0.2Ce0.8O2-x (SDC20) thin films were deposited on (100)-oriented Nb-doped SrTiO3 (NSTO) and (110)-oriented NSTO substrates using pulsed laser deposition (PLD). Devices constructed with a Pt/SDC20/NSTO structure exhibited reversible and stable bipolar resistive switching (RS) behavior. The differences in conduction mechanisms between single-crystal and polycrystalline devices were confirmed, with single-crystal devices displaying a larger resistance window and higher stability. Combining the results of XPS and I-V curve fitting, it was confirmed that defects near the grain boundaries in the SDC-based memristors capture electrons, thereby affecting the overall performance of the RRAM devices.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Materials (Basel) Ano de publicação: 2024 Tipo de documento: Article País de afiliação: China

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Materials (Basel) Ano de publicação: 2024 Tipo de documento: Article País de afiliação: China
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