Microscale Adaptive Optics: Wave-Front Control with a mu-Mirror Array and a VLSI Stochastic Gradient Descent Controller.

The performance of adaptive systems that consist of microscale on-chip elements [microelectromechanical mirror (mu-mirror) arrays and a VLSI stochastic gradient descent microelectronic control system] is analyzed. The mu-mirror arrays with 5 x 5 and 6 x 6 actuators were driven with a control system composed of two mixed-mode VLSI chips implementing model-free beam-quality metric optimization by the stochastic parallel perturbative gradient descent technique. The adaptation rate achieved was near 6000 iterations/s. A secondary (learning) feedback loop was used to control system parameters during the adaptation process, further increasing the adaptation rate.

Ion-beam machining of millimeter scale optics.

An ion-beam microcontouring process is developed and implemented for figuring millimeter scale optics. Ion figuring is a noncontact machining technique in which a beam of high-energy ions is directed toward a target substrate to remove material in a predetermined and controlled fashion. Owing to this noncontact mode of material removal, problems associated with tool wear and edge effects, which are common in conventional machining processes, are avoided. Ion-beam figuring is presented as an alternative for the final figuring of small (<1-mm) optical components. The depth of the material removed by an ion beam is a convolution between the ion-beam shape and an ion-beam dwell function, defined over a two-dimensional area of interest. Therefore determination of the beam dwell function from a desired material removal map and a known steady beam shape is a deconvolution process. A wavelet-based algorithm has been developed to model the deconvolution process in which the desired removal contours and ion-beam shapes are synthesized numerically as wavelet expansions. We then mathematically combined these expansions to compute the dwell function or the tool path for controlling the figuring process. Various models have been developed to test the stability of the algorithm and to understand the critical parameters of the figuring process. The figuring system primarily consists of a duo-plasmatron ion source that ionizes argon to generate a focused (approximately 200-microm FWHM) ion beam. This beam is rastered over the removal surface with a perpendicular set of electrostatic plates controlled by a computer guidance system. Experimental confirmation of ion figuring is demonstrated by machining a one-dimensional sinusoidal depth profile in a prepolished silicon substrate. This profile was figured to within a rms error of 25 nm in one iteration.