RESUMO
The Hummers' method for graphite oxide (GO) preparation has been applied to graphite nanoplatelets, in order to achieve higher reaction yield and faster kinetics. Aqueous GO solutions have been used to produce uniform GO films on a polyethylene terephthalate substrate, generating graphene patterns in a controlled way (widths of a few tens of microns). The reduction of GO deposited on the polymeric substrate has been performed by using a Nd:YVO4 continuous-wave frequency-duplicated laser. Spectroscopic and diffractometric characterizations (FT-IR, visible-NIR, Raman, XPS, and XRD) have shown that the reduction process induced by the laser annealing technique is mainly due to dehydration of the GO layers. It has been obtained by means of a suitable laser optical apparatus, a controlled reduction of GO without damaging the substrate, and precise writing of micro-tracks that can be used as electrically and thermally conductive patterns.
RESUMO
An advantageous micromechanical technique to deposit large area graphene nanoplatelet (GNP) thin films on a low-density polyethylene substrate is proposed. This method is based on the application of shear-stress and friction forces to a graphite platelets/ethanol paste on the surface of a polymeric substrate; it allows us to obtain a continuous film of superimposed nanoplatelets mainly made of 13-30 graphene layers. X-ray diffraction (XRD), atomic force and transmission electron microscopy (TEM) measurements support the occurrence of a partial exfoliation of the graphite platelets due to shear-stress and friction forces applied during film formation. Scanning electron microscopy (SEM) observations point out that the surface of the polymer is uniformly coated by the overlap of GNPs, and TEM analysis reveals the tendency of the nanoplatelets to align parallel to the interface plane. It has been found that the deposited samples, under white light illumination, exhibit a negative photoconductivity and a linear photoresponse as a function of the applied voltage and the optical power density in the -120 ÷ 120 mV and 20.9 ÷ 286.2 mW cm-2 ranges, respectively.
RESUMO
Different classes of interesting materials (such as protocrystalline, microcrystalline and nanocrystalline) have been grown under conditions very near to those for the microcrystalline phase. In spite of the importance of these materials, a clear picture regarding their phase transitions is missing. A smooth transition from the microcrystalline to the nanocrystalline silicon phase, distinctly different from an abrupt order-disorder phase transition, has been demonstrated, for the first time, in hydrogenated silicon-carbon alloy films, prepared from a silane-methane gas mixture highly diluted in hydrogen, by varying the rf power in a plasma enhanced chemical vapour deposition system. The study has also provided the signature of medium range order in hydrogenated silicon-carbon alloy films.
RESUMO
In the present paper, we report the study of the adsorption behavior of a model protein such as human serum albumin (HSA) onto surfaces of a-SiC:H and a-C:H thin films deposited by using the plasma-enhanced chemical vapor deposition (PECVD) technique. The surface composition and surface energy of the various substrates as well as the evaluation of the adsorbed amount of protein has been carried out by means of X-ray photoelectron spectroscopy (XPS) and contact angle measurements. It has been found that HSA tends to preferentially adsorb on Si-rich surfaces, as far as the relative amount of adsorbed HSA decreases with increasing S-C concentration. Preliminary elements of mechanistic models are proposed for the correlation between chemical factors and the observed protein adsorption behavior.
