Magnetically controllable silicon microring with ferrofluid cladding.

We experimentally investigate the application of magnetic fluids (MFs) on integrated silicon photonics. Using a ferrofluid-clad silicon microring resonator, we demonstrate active control of resonances by applying an external magnetic field. Relatively high loaded quality factors on the order of 6000 are achieved, despite the optical losses introduced by the magnetic nanoparticles. We demonstrate resonance shifts of 185 pm in response to a 110 Oe strong magnetic field, corresponding to an overall refractive index change of -3.2×10-3 for the cladding MF. The combination of MFs and integrated photonics could potentially lead to the development of magnetically controllable optical devices and ultra-compact cost-effective magnetic field sensors.

Hybrid planar microresonators with organic and InGaAs active media.

The authors report on the fabrication of hybrid planar micro-resonators based on InGaAs microdisks with an evaporated organic material. Samples of InGaAs grown on InP(100) substrates are obtained by Chemical Beam Epitaxy, and microdisks of InGaAs with different diameters are fabricated by focused ion beam. The hybrid disks are obtained by the subsequent evaporation of 8-hydroxyquinoline aluminium doped with 4-Dicyanomethylene-2-methyl-6-(p-dimethylaminostyryl)-4H-pyran on the InGaAs microdisks. The devices, characterized by micro- and confocal photoluminescence imaging and spectroscopy, exhibit emission around 650 nm, from the organic material for disks with different radius. Finally, simultaneous emission in the visible and at whispering gallery resonant modes in the 1350-1450 nm range are observed due to excitation transfer to InGaAs. These devices open the possibility to combine the flexibility of organics with the high gain of III-V compounds for wavelength down conversion and telecom applications.

The effect of Ge implantation dose on the optical properties of Ge nanocrystals in SiO(2).

Ge nanocrystallites (Ge-nc) embedded in a SiO(2) matrix are investigated using Raman spectroscopy, photoluminescence and Fourier transform infrared spectroscopy. The samples were prepared by ion implantation with different implantation doses (0.5, 0.8, 1, 2, 3 and 4) × 10(16) cm(-2) using 250 keV energy. After implantation, the samples were annealed at 1000 °C in a forming gas atmosphere for 1 h. All samples show a broad Raman spectrum centred at w≈304 cm(-1) with a slight shift depending on the implantation doses. The Raman intensity also depends on the Ge(74+) dose. A maximum photoluminescence intensity is observed for the sample implanted at room temperature with a dose of 2 × 10(16) cm(-2) at 3.2 eV. Infrared spectroscopy shows that the SiO(2) films moved off stoichiometry due to Ge(74+) ion implantation, and Ge oxides are formed in it. This result is shown as a reduction of GeO(x) at exactly the dose corresponding to the maximum blue-violet PL emission and the largest Raman emission at 304 cm(-1). Finally, the Raman spectra were fitted with a theoretical expression to evaluate the average size, full-width at half-maximum (FWHM) and dispersion of Ge-nc size.