Structural and optical performance of NiV/Ti multilayer mirrors for Z-pinch plasma diagnostic at the wavelength region of 350-450†eV.

This Letter reports on investigations of novel, to the best of our knowledge, NiV(Ni93V7)/Ti multilayer mirrors for the operation in the wavelength region of 350-450 eV. Such mirrors are promising optical components for the Z-pinch plasma diagnostic. The NiV/Ti multilayers show superior structural and optical performance compared to conventional Ni/Ti multilayers. Replacing Ni with NiV in multilayers decreases interface widths and enhances the contrast of the refractive index between the absorber and spacer layers. The improvement of interface quality contributes to the enhancement in reflectance. Under the grazing incidence of 13°, a peak reflectivity of 25.1% at 429 eV is achieved for NiV/Ti multilayers, while 17.7% at 427 eV for Ni/Ti.

Multilayer beamsplitter polarizers for key UV-FUV spectral lines of solar polarimetry.

Multilayer beamsplitter polarizers have been developed for improved solar polarimetry at key spectral lines. The advantage of beamsplitter polarizers is that a single device separates s from p polarization; this helps minimize attenuation and enables a more compact and lighter polarimeter, which is important for space instruments. Polarizers based on Al/AlF3 multilayers were prepared for both C IV (155 nm) and Mg II (280 nm) lines, and based on Al/MgF2 multilayers for H Lyman α line (121.6 nm). Polarizers were designed to mainly reflect (transmit) s (p) polarization. Beamsplitter performance and throughput are shown to compare advantageously with polarizers in the literature. Beamsplitter polarizers kept a valuable performance after several years of ageing.

Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance.

The absorption of extreme ultraviolet (EUV) radiation by a photoresist strongly depends on its atomic composition. Consequently, elements with a high EUV absorption cross section can assist in meeting the demand for higher photon absorbance by the photoresist to improve the sensitivity and reduce the photon shot noise induced roughness. In this work, we enhanced the EUV absorption of the methacrylic acid ligands of Zn oxoclusters by introducing fluorine atoms. We evaluated the lithography performance of this fluorine-rich material as a negative tone EUV photoresist along with extensive spectroscopic and microscopic studies, providing deep insights into the underlying mechanism. UV-vis spectroscopy studies demonstrate that the presence of fluorine in the oxocluster enhances its stability in the thin films to the ambient atmosphere. However, the EUV photoresist sensitivity (D 50) of the fluorine-rich oxocluster is decreased compared to its previously studied methacrylic acid analogue. Scanning transmission X-ray microscopy and in situ X-ray photoelectron spectroscopy in combination with FTIR and UV-vis spectroscopy were used to gain insights into the chemical changes in the material responsible for the solubility switch. The results support decarboxylation of the ligands and subsequent radical-induced polymerization reactions in the thin film upon EUV irradiation. The rupture of carbon-fluorine bonds via dissociative electron attachment offers a parallel way of generating radicals. The mechanistic insights obtained here will be applicable to other hybrid materials and potentially pave the way for the development of EUV materials with better performance.

Stability of Cr/C multilayer during synchrotron radiation exposure and thermal annealing.

The stability of Cr/C multilayer during irradiation or thermal annealing was investigated using grazing incidence X-ray reflectivity measurement, X-ray photoelectron spectroscopy, X-ray diffraction analysis, small-angle X-ray scattering analysis, and soft X-ray reflectivity measurement. One sample was irradiated with a white beam of synchrotron radiation and five other samples were annealed at various temperatures. The 18-h irradiation treatment caused local surface contaminants but did not affect the buried stacks. The annealing treatment resulted in increased reflectivity at approximately 1.2 keV, and the multilayer remained stable for temperature up to 700 °C. Thus, the Cr/C multilayers exhibited excellent stability during irradiation and thermal treatments and can be used for the mirrors and multilayer gratings of third-generation synchrotron radiation systems.

Electronic structure of MAPbI3 and MAPbCl3: importance of band alignment.

Since their first appearance, organic-inorganic perovskite absorbers have been capturing the attention of the scientific community. While high efficiency devices highlight the importance of band level alignment, very little is known on the origin of the strong n-doping character observed in the perovskite. Here, by means of a highly accurate photoemission study, we shed light on the energy alignment in perovskite-based devices. Our results suggest that the interaction with the substrate may be the driver for the observed doping in the perovskite samples.

Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy.

Gratings, one of the most important energy dispersive devices, are the fundamental building blocks for the majority of optical and optoelectronic systems. The grating period is the key parameter that limits the dispersion and resolution of the system. With the rapid development of large X-ray science facilities, gratings with periodicities below 50 nm are in urgent need for the development of ultrahigh-resolution X-ray spectroscopy. However, the wafer-scale fabrication of nanogratings through conventional patterning methods is difficult. Herein, we report a maskless and high-throughput method to generate wafer-scale, multilayer gratings with period in the sub-50 nm range. They are fabricated by a vacancy epitaxy process and coated with X-ray multilayers, which demonstrate extremely large angular dispersion at approximately 90 eV and 270 eV. The developed new method has great potential to produce ultrahigh line density multilayer gratings that can pave the way to cutting edge high-resolution spectroscopy and other X-ray applications.

Structure, stress and optical properties of Cr/C multilayers for the tender X-ray range.

Cr/C multilayer optics are a suitable choice for the tender X-ray range (1-4 keV) that covers the K absorption edges of P, S, Cl and 3d transition metals as well as the L absorption edges of 4d transition metals. In particular, these optics are studied in order to optimize the optical properties of collimated plane-grating monochromators. In this paper, the structure, stress and optical properties of Cr/C multilayers (fabricated using direct-current magnetron sputtering) with bi-layer number of 20 and the same period (about 11.64 nm) but different Cr thickness ratio (0.20-0.80) are investigated. Firstly, the grazing-incidence X-ray reflectivity at 8.04 keV was measured. These measurements were fitted assuming a multilayer structure with a four-layer and non-periodic model. Results and fitting show that interface widths increase with the Cr thickness ratio. The results obtained from X-ray diffraction at 8.04 keV were consistent with high-resolution transmission electron microscopy which showed an increase in grain size of the Cr layers. In addition, the stresses of the Cr/C multilayers have been measured and the results show that the stress value approaches zero when the Cr thickness ratio is about 0.45. The reflectivity of a Cr/C multilayer with Cr thickness ratio of 0.37 was measured and reaches 26.6% at 1.04 keV. The measured reflectivity matches very well with the predicted value using the four-layer and non-periodic model, which confirmed the viability of the prediction. Thus, the reflectivity at 1.04 keV of a Cr/C multilayer with different Cr thickness ratio was predicted and was found to drastically decrease when the Cr thickness ratio is larger than 0.37. It has been determined that a Cr thickness ratio value of 0.37 is the best choice for a Cr/C multilayer in view of high reflectivity and low stress.

Kossel Effect in Periodic Multilayers.

The Kossel effect is the diffraction by a periodically structured medium, of the characteristic X-ray radiation emitted by the atoms of the medium. We show that multilayers designed for X-ray optics applications are convenient periodic systems to use in order to produce the Kossel effect, modulating the intensity emitted by the sample in a narrow angular range defined by the Bragg angle. We also show that excitation can be done by using photons (X-rays), electrons or protons (or charged particles), under near normal or grazing incident geometries, which makes the method relatively easy to implement. The main constraint comes from the angular resolution necessary for the detection of the emitted radiation. This leads to small solid angles of detection and long acquisition times to collect data with sufficient statistical significance. Provided this difficulty is overcome, the comparison or fit of the experimental Kossel curves, i.e., the angular distributions of the intensity of an emitted radiation of one of the element of the periodic stack, with the simulated curves enables getting information on the depth distribution of the elements throughout the multilayer. Thus the same kind of information obtained from the more widespread method of X-ray standing wave induced fluorescence used to characterize stacks of nanometer period, can be obtained using the Kossel effect.

Oxygen Impurities Link Bistability and Magnetoresistance in Organic Spin Valves.

Vertical crossbar devices based on manganite and cobalt injecting electrodes and a metal-quinoline molecular transport layer are known to manifest both magnetoresistance (MR) and electrical bistability. The two effects are strongly interwoven, inspiring new device applications such as electrical control of the MR and magnetic modulation of bistability. To explain the device functionality, we identify the mechanism responsible for electrical switching by associating the electrical conductivity and the impedance behavior with the chemical states of buried layers obtained by in operando photoelectron spectroscopy. These measurements revealed that a significant fraction of oxygen ions migrate under voltage application, resulting in a modification of the electronic properties of the organic material and of the oxidation state of the interfacial layer with the ferromagnetic contacts. Variable oxygen doping of the organic molecules represents the key element for correlating bistability and MR, and our measurements provide the first experimental evidence in favor of the impurity-driven model describing the spin transport in organic semiconductors in similar devices.

High Reflectance Nanoscale V/Sc Multilayer for Soft X-ray Water Window Region.

V/Sc multilayer is experimentally demonstrated for the first time as a high reflectance mirror for the soft X-ray water window region. It primarily works at above the Sc-L edge (λ = 3.11 nm) under near normal incidence while a second peak appears at above the V-L edge (λ = 2.42 nm) under grazing incidence. The V/Sc multilayer fabricated with a d-spacing of 1.59 nm and 30 bilayers has a smaller interface width (σ = 0.27 and 0.32 nm) than the conventional used Cr/Sc (σ = 0.28 and 0.47 nm). For V/Sc multilayer with 30 bilayers, the introduction of B4C barrier layers has little improvement on the interface structure. As the number of bilayers increasing to 400, the growth morphology and microstructure of the V/Sc layers evolves with slightly increased crystallization. Nevertheless, the surface roughness remains to be 0.25 nm. A maximum soft X-ray reflectance of 18.4% is measured at λ = 3.129 nm at 9° off-normal incidence using the 400-bilayers V/Sc multilayer. According to the fitted model, an s-polarization reflectance of 5.2% can also be expected at λ = 2.425 nm under 40° incidence. Based on the promising experimental results, further improvement of the reflectance can be achieved by using a more stable deposition system, exploring different interface engineering methods and so on.

Nitridated Pd/B4C multilayer mirrors for soft X-ray region: internal structure and aging effects.

Reactive sputtering with a mixture of argon and nitrogen (N2 partial pressure of 4%, 8%, and 15%) as the working gas is used to develop the high reflectance Pd/B4C multilayers for soft X-ray region application. Compared to the pure Ar fabricated sample, the interface roughness of the nitridated multilayer is slightly increased while the compressive stress is essentially relaxed from -623 MPa (pure Ar) to -85 MPa (15% N2). A maximum reflectance of 32% is measured at the wavelength of 9.5 nm for the multilayer fabricated with 15% N2. After storing the multilayers in an air environment for 6-17 months, a distinct aging effect is observed on the nitridated samples. The transmission electron microscopy results indicate that a large part of the top layers of the nitridated samples is deteriorated with severe interdiffusion, essential decrease in d-spacing, and compacted multilayer structure. The deterioration is less pronounced for the multilayers fabricated with a higher ratio of N2. Energy dispersive X-ray spectroscopy reveals that the concentration of nitrogen and boron in the degraded area is much reduced compared to the intact layers. A primitive model of upward diffusion of nitrogen and boron is proposed to explain the aging effects of the nitridated structure.

Improvement of interface structure and polarization performance of Co/C multilayers by incorporation of nitrogen.

Short-period (~3.5 nm) Co/C multilayer mirrors are fabricated by the direct current magnetron sputtering technique through the addition of a small proportion of nitrogen (4-15% partial pressure) to the working gas (Ar). The addition of nitrogen has been demonstrated to significantly suppress the interdiffusion of neighboring materials due to the nitridation of carbon layers as compared with the Co/C multilayer fabricated with the use of pure Ar. The optimal partial pressure of nitrogen was found to be 6%. At this pressure, nitrogen provides abrupt interfaces and the maximal peak value (19%) of the s-polarized radiation reflectivity at the 251-eV photon energy and 45° angle of incidence. The p-polarized radiation reflectivity proved to be less than 0.3%, demonstrating high potentialities of the nitridated Co/C multilayers as Bragg polarizers in the 4.5-6.5-nm spectral range.

Electronic structure of CuTPP and CuTPP(F) complexes: a combined experimental and theoretical study II.

The unoccupied electronic structure of thick films of tetraphenylporphyrin and tetrakis(pentafluorophenyl)porphyrin Cu(ii) complexes (hereafter, CuTPP and CuTPP(F)) deposited on Au(111) has been studied by combining the outcomes of near-edge X-ray absorption fine structure (NEXAFS) spectroscopy with those of spin-unrestricted time-dependent density functional (TD-DFT) calculations carried out either within the scalar relativistic zeroth order regular approximation (ZORA) framework (C, N and F K-edges) or by using the Tamm-Dancoff approximation coupled to ZORA and including spin-orbit effects (Cu L2,3-edges). Similarly to the modelling of NEXAFS outcomes pertaining to other Cu(ii) complexes, the agreement between theory and experiment is more than satisfactory, thus confirming the open-shell TD-DFT to be a useful tool to look into NEXAFS results pertinent to Cu(ii) compounds. The combined effect of metalation and phenyl (Ph) fluorine decoration is found to favour an extensive mixing between (Ph)σ* and pristine porphyrin macrocyle (pmc) (pmc)π* virtual levels. The lowest lying excitation in the C and N K-edge spectra of both CuTPP and CuTPP(F) is associated with a ligand-to-metal-charge-transfer transition, unambiguously revealed in the (CuTPP)N K-edge spectral pattern. Moreover, the comparison with literature data pertaining to the modelling of the (Cu(II))L2,3 features in the phthalocyanine-Cu(ii) (CuPc) complex provided further insights into how metal-to-ligand-charge-transfer transitions associated with excitations from 2p(Cu(II)) AOs to low-lying, ligand-based π* MOs may contribute to the Cu(ii) L2,3-edge intensity and thus weaken its believed relationship with the Cu(ii)-ligand symmetry-restricted covalency. Despite the coordinative pocket of CuTPP/CuTPP(F) mirroring CuPc, the ligand-field strength exerted by the phthalocyanine ligand on the Cu(ii) centre is experimentally found and theoretically confirmed to be slightly stronger than that experienced by Cu in CuTPP and CuTPP(F). On the whole, the obtained results complement those published in the near past by the same group on the occupied and empty states of the H2TPP and H2TPP(F) free ligands as well as on the occupied states of both CuTPP and CuTPP(F), thus providing the final piece to get a thorough description of electronic perturbations associated with the metalation and the Ph halogen decoration of H2TPP.

Case studies on the formation of chalcogenide self-assembled monolayers on surfaces and dissociative processes.

This report examines the assembly of chalcogenide organic molecules on various surfaces, focusing on cases when chemisorption is accompanied by carbon-chalcogen atom-bond scission. In the case of alkane and benzyl chalcogenides, this induces formation of a chalcogenized interface layer. This process can occur during the initial stages of adsorption and then, after passivation of the surface, molecular adsorption can proceed. The characteristics of the chalcogenized interface layer can be significantly different from the metal layer and can affect various properties such as electron conduction. For chalcogenophenes, the carbon-chalcogen atom-bond breaking can lead to opening of the ring and adsorption of an alkene chalcogenide. Such a disruption of the π-electron system affects charge transport along the chains. Awareness about these effects is of importance from the point of view of molecular electronics. We discuss some recent studies based on X-ray photoelectron spectroscopy that shed light on these aspects for a series of such organic molecules.

High reflectance Cr/V multilayer with B(4)C barrier layer for water window wavelength region.

To develop the high reflectance mirror for the short wavelength range of the water window region (λ=2.42-2.73 nm), Cr/V multilayers with B4C barrier layers are studied. The grazing incidence x-ray reflectometry results show that the multilayer interface widths are significantly reduced down to 0.21-0.31 nm, after the introduction of 0.1 nm B4C barrier layers at both interfaces. The [B4C/Cr/B4C/V] multilayer with a large number of bilayers of N=300 maintains the same small interface widths while the surface roughness is only 0.2 nm. According to the transmission electron microscope measurements, the layer structure improvement with barrier layers can be attributed to the suppression of the crystallization of vanadium inside the structure. Using the interface engineered multilayer, a maximum soft x-ray reflectance of 24.3% is achieved at λ=2.441 nm, under the grazing incidence of 42°.

X-ray fluorescence induced by standing waves in the grazing-incidence and grazing-exit modes: study of the Mg-Co-Zr system.

The characterization of Mg-Co-Zr tri-layer stacks using X-ray fluorescence induced by X-ray standing waves, in both the grazing-incidence (GI) and the grazing-exit (GE) modes, is presented. The introduction of a slit in the direction of the detector improves the angular resolution by a factor of two and significantly improves the sensitivity of the technique for the chemical characterization of the buried interfaces. By observing the intensity variations of the Mg Kα and Co Lα characteristic emissions as a function of the incident (GI mode) or detection (GE mode) angle, it is shown that the interfaces of the Si/[Mg/Co/Zr] × 30 multilayer are abrupt, whereas in the Si/[Mg/Zr/Co] × 30 multilayer a strong intermixing occurs at the Co-on-Zr interfaces. An explanation of this opposite behavior of the Co-on-Zr and Zr-on-Co interfaces is given by the calculation of the mixing enthalpies of the Co-Mg, Co-Zr and Mg-Zr systems, which shows that the Co-Zr system presents a negative value and the other two systems present positive values. Together with the difference of the surface free energies of Zr and Co, this leads to the Mg/Zr/Co system being considered as a Mg/CoxZry bi-layer stack, with x/y estimated around 3.5.

Phase measurement of soft x-ray multilayer mirrors.

We propose a new model enabling the extraction of the phase of a multilayer mirror from photocurrent measurements in the soft x rays. In this range, the effects of the mean free path of the electrons inside the stack can no longer be neglected, which prevents the phase reconstruction by conventional photocurrent measurements. The new model takes into account this phenomenon and thus extends up to the x rays the applicability range of the technique. This approach has been validated through a numerical and experimental study of chromium/scandium multilayers used near 360 eV. To our knowledge, this work constitutes the first measurement of the phase of a multilayer mirror in the soft x-ray range.

Tuning the Electronic Structure of Graphene by Molecular Dopants: Impact of the Substrate.

A combination of ultraviolet and X-ray photoelectron spectroscopy, X-ray absorption spectroscopy, and first principle calculations was used to study the electronic structure at the interface between the strong molecular acceptor 1,3,4,5,7,8-hexafluorotetracyano-naphthoquinodimethane (F6TCNNQ) and a graphene layer supported on either a quartz or a copper substrate. We find evidence for fundamentally different charge redistribution mechanisms in the two ternary systems, as a consequence of the insulating versus metallic character of the substrates. While electron transfer occurs exclusively from graphene to F6TCNNQ on the quartz support (p-doping of graphene), the Cu substrate electron reservoir induces an additional electron density flow to graphene decorated with the acceptor monolayer. Remarkably, graphene on Cu is n-doped and remains n-doped upon F6TCNNQ deposition. On both substrates, the work function of graphene increases substantially with a F6TCNNQ monolayer atop, the effect being more pronounced (∼1.3 eV) on Cu compared to quartz (∼1.0 eV) because of the larger electrostatic potential drop associated with the long-distance graphene-mediated Cu-F6TCNNQ electron transfer. We thus provide a means to realize high work function surfaces for both p- and n-type doped graphene.

Transmittance and optical constants of Ca films in the 4-1000 eV spectral range.

The low expected absorption of Ca in the extreme ultraviolet (EUV) makes it an attractive material for multilayers and filters because most materials in nature strongly absorb the EUV. Few optical constant data had been reported for Ca. In this research, Ca films of various thicknesses were deposited on grid-supported C films and their transmittance measured in situ from the visible to the soft x-rays. The measurement range contains M2,3 and L2,3 absorption edges. Transmittance measurements were used to obtain the Ca extinction coefficient k. A minimum k of 0.017 was obtained at ∼23 eV, which makes Ca a promising low-absorption material for EUV coatings. A second spectral range of interest for its low absorption is below the Ca L3 edge at ∼343 eV. Measured k data and extrapolations were used to calculate the refractive index n using Kramers-Krönig relations. This is the first self-consistent data set on Ca covering a wide spectral range including the EUV.

New one-step thiol functionalization procedure for Ni by self-assembled monolayers.

This article reports on a facile and fast strategy for the self-assembled monolayer (SAM) functionalization of nickel surfaces, employing cyclic voltammetry (CV) cycling of a suitable tailored solution containing the species to be adsorbed. Results are presented for ultrathin films formed on Ni by 1-hexadecanethiol (C16), L-cysteine (L-cys), and the poly{methyl (2R)-3-(2,2'-bithiophen-4-ylsulfanyl)-2-[(tert-butoxycarbonyl)amino]propanoate} (PCT-L) thiophene-based chiral polymer. The effective formation of high-quality ultrathin organic films on the nickel was verified both electrochemically and by exploiting typical surface characterization techniques such as contact angle, ellipsometry, atomic force microscopy (AFM), polarization modulation-infrared reflection-absorption spectroscopy (PM-IRRAS), and X-ray photoelectron spectroscopy (XPS).