Improved peak-to-peak method for cavity length measurement of a Fabry-Perot etalon using a mode-locked femtosecond laser.

Differing from the conventional peak-to-peak method using two neighboring spectral peaks in the frequency-domain fringe spectrum of the spectral response of a Fabry-Perot etalon to a femtosecond laser, which contains N spectral peaks equally spaced with a spacing of the etalon free spectral range (FSR), the proposed method employs a pair of spectral peaks with a spacing of an integer multiple k (k ≫ 1) of FSR for measurement of the etalon cavity length d with a reduced measurement error. Under the constrain of the total N spectral peaks obtainable in the finite spectral range of the femtosecond laser, the optimized k is identified to be N∕2 in consideration of an averaging operation using N - k samples of d to achieve the minimum measurement error. The feasibility of the proposed method is demonstrated by experimental results with an uncertainty analysis based on "Guides to the Expression of Uncertainty in Measurement".

Active Probe Atomic Force Microscopy with Quattro-Parallel Cantilever Arrays for High-Throughput Large-Scale Sample Inspection.

An Atomic Force Microscope (AFM) is a powerful and versatile tool for nanoscale surface studies to capture 3D topography images of samples. However, due to their limited imaging throughput, AFMs have not been widely adopted for large-scale inspection purposes. Researchers have developed high-speed AFM systems to record dynamic process videos in chemical and biological reactions at tens of frames per second, at the cost of a small imaging area of up to several square micrometers. In contrast, inspecting large-scale nanofabricated structures, such as semiconductor wafers, requires nanoscale spatial resolution imaging of a static sample over hundreds of square centimeters with high productivity. Conventional AFMs use a single passive cantilever probe with an optical beam deflection system, which can only collect one pixel at a time during AFM imaging, resulting in low imaging throughput. This work utilizes an array of active cantilevers with embedded piezoresistive sensors and thermomechanical actuators, which allows simultaneous multi-cantilever operation in parallel operation for increased imaging throughput. When combined with large-range nano-positioners and proper control algorithms, each cantilever can be individually controlled to capture multiple AFM images. With data-driven post-processing algorithms, the images can be stitched together, and defect detection can be performed by comparing them to the desired geometry. This paper introduces principles of the custom AFM using the active cantilever arrays, followed by a discussion on practical experiment considerations for inspection applications. Selected example images of silicon calibration grating, highly-oriented pyrolytic graphite, and extreme ultraviolet lithography masks are captured using an array of four active cantilevers ("Quattro") with a 125 µm tip separation distance. With more engineering integration, this high-throughput, large-scale imaging tool can provide 3D metrological data for extreme ultraviolet (EUV) masks, chemical mechanical planarization (CMP) inspection, failure analysis, displays, thin-film step measurements, roughness measurement dies, and laser-engraved dry gas seal grooves.

In situ, back-focal-plane-based determination of the numerical apertures in optical microscopes.

In this contribution, we present a technique for in situ determination of the numerical apertures (NAs) of optical microscopes using calibrated diffraction gratings. Many commonly practiced procedures use an external setup to determine the objective and condenser NAs. However, these values may become modified in the used microscope systems, e.g., by system intrinsic apertures. Therefore, in our improved technique, determination of the imaging NA is conducted in situ within the corresponding microscope at hand. Furthermore, the method has been extended to yield the microscope's illumination NA as well. In total, we tested this procedure for determination of the imaging NA for four different microscope objectives with nominal values of 0.55 and 0.9, together with the illumination NAs for four different circular aperture diaphragms with diameters between 10 µm and 500 µm using several gratings of different pitches. All determined NA values agree essentially with their nominal values within their experimental uncertainties, but the uncertainties have been reduced by typically an order of magnitude as compared with the manufacturer's specifications.

A GPS-Referenced Wavelength Standard for High-Precision Displacement Interferometry at λ = 633 nm.

Since the turn of the millennium, the development and commercial availability of optical frequency combs has led to a steadily increase of worldwide installed frequency combs and a growing interest in using them for industrial-related metrology applications. Especially, GPS-referenced frequency combs often serve as a "self-calibrating" length standard for laser wavelength calibration in many national metrology institutes with uncertainties better than u = 1 × 10-11. In this contribution, the application of a He-Ne laser source permanently disciplined to a GPS-referenced frequency comb for the interferometric measurements in a nanopositioning machine with a measuring volume of 200 mm × 200 mm × 25 mm (NPMM-200) is discussed. For this purpose, the frequency stability of the GPS-referenced comb is characterized by heterodyning with a diode laser referenced to an ultrastable cavity. Based on this comparison, an uncertainty of u = 9.2 × 10-12 (τ = 8 s, k = 2) for the GPS-referenced comb has been obtained. By stabilizing a tunable He-Ne source to a single comb line, the long-term frequency stability of the comb is transferred onto our gas lasers increasing their long-term stability by three orders of magnitude. Second, short-term fluctuations-related length measurement errors were reduced to a value that falls below the nominal resolving capabilities of our interferometers (ΔL/L = 2.9 × 10-11). Both measures make the influence of frequency distortions on the interferometric length measurement within the NPMM-200 negligible. Furthermore, this approach establishes a permanent link of interferometric length measurements to an atomic clock.

Processing and Analysis of Long-Range Scans with an Atomic Force Microscope (AFM) in Combination with Nanopositioning and Nanomeasuring Technology for Defect Detection and Quality Control.

This paper deals with a planar nanopositioning and -measuring machine, the so-called nanofabrication machine (NFM-100), in combination with a mounted atomic force microscope (AFM). This planar machine has a circular moving range of 100 mm. Due to the possibility of detecting structures in the nanometre range with an atomic force microscope and the large range of motion of the NFM-100, structures can be analysed with high resolution and precision over large areas by combining the two systems, which was not possible before. On the basis of a grating sample, line scans over lengths in the millimetre range are demonstrated on the one hand; on the other hand, the accuracy as well as various evaluation methods are discussed and analysed.

Phase-Modulated Standing Wave Interferometer.

The actual technical implementation of conventional interferometers is quite complex and requires manual manufacturing. In combination with the required construction space defined by the optical setup, their applications are limited to selected measuring tasks. In contrast, Standing Wave Interferometers (SWIs) offer an enormous potential for miniaturisation because of their simple linear optical setup, consisting only of a laser source, a measuring mirror and two transparent standing wave sensors for obtaining quadrature signals. The two sensors are located inside the measuring beam and therefore directly influence the length measurement. To reduce optical influences on the standing wave and avoid the need for an exact and long-term stable sensor-to-sensor-distance, a single sensor configuration was developed. There, a phase modulation is superimposed to the sensor signal by a forced oscillation of the measuring mirror. When the correct modulation stroke is applied, the resulting harmonics in the sensor signal are 90° phase-shifted to each other and can hence be used for obtaining quadrature signals for phase demodulation and direction discrimination by an arctan-algorithm.

Linear Displacement Calibration System Integrated with a Novel Auto-Alignment Module for Optical Axes.

The quality of processed workpieces is affected directly by the precision of the linear stage. Therefore, the linear displacement calibration of machine tools must be implemented before delivery and after employment for a period of time. How to perform a precise calibration with high inspection efficiency is a critical issue in the precision mechanical engineering industry. In this study, the self-developed system integrated by the measurement module based on the common path Fabry-Pérot interferometer for linear displacement and the auto-alignment module for optical axes was proposed to realize the automatic linear displacement calibration of the linear stages. The measurement performance of the developed structure was verified experimentally. With the auto-alignment module, the cosine error was reduced to 0.36 nm and the entire procedure accomplished within 75 s without the limitation of the perceived resolution of the human eye, operational experience, and the risk of misalignment and broken cable. According to the comparison of experimental results for the linear displacement, the repeatability of the proposed measurement module was less than 0.171 µm. After the compensation procedure according to the linear displacement calibration, the systematic positional deviation, repeatability, and accuracy of the linear axis could be improved to 4 µm, 1 µm, and 5 µm respectively. Hence, the calibration efficiency can be improved by 80% with the proposed compact system, which is beneficial for the linear displacement calibration of machine tools in the precision mechanical engineering industry.

Insights into the Crystallinity of Layer-Structured Transition Metal Dichalcogenides on Potassium Ion Battery Performance: A Case Study of Molybdenum Disulfide.

Layer-structured transition metal dichalcogenides (LS-TMDs) are being heavily studied in K-ion batteries (KIBs) owing to their structural uniqueness and interesting electrochemical mechanisms. Synthetic methods are designed primarily focusing on high capacities. The achieved performance is often the collective results of several contributing factors. It is important to decouple the factors and understand their functions individually. This work presents a study focusing on an individual factor, crystallinity, by taking MoS2 as a demonstrator. The performance of low and high-crystallized MoS2 is compared to show the function of crystallinity is dependent on the electrochemical mechanism. Lower crystallinity can alleviate diffusional limitation in 0.5-3.0 V, where intercalation reaction takes charge in storing K-ions. Higher crystallinity can ensure the structural stability of the MoS2 layers and promote surface charge storage in 0.01-3.0 V, where conversion reaction mainly contributes. The low-crystallized MoS2 exhibits an intercalation capacity (118 mAh g-1 ), good cyclability (85% over 100 cycles), and great rate capability (41 mAh g-1 at 2 A g-1 ), and the high-crystallized MoS2 delivers a high capacity of 330 mAh g-1 at 1 A g-1 and retains 161 mAh g-1 at 20 A g-1 , being one of the best among the reported LS-TMDs in KIBs.

Total momentum transfer produced by the photons of a multi-pass laser beam as an evident avenue for optical and mass metrology.

The use of the radiation pressure of a laser field, as an effect of the momentum transfer of the absorbed and re-emitted photons, suggests rather a complementary than an alternative possibility for metrology to generate calibration forces or to calibrate the optical power directly traceable to the International System of Units (SI). This paper reports a method and experimentally measured evidence on options to extend the effective use of radiation pressure for generating optical forces in the sub-microNewton (µN) range. Among other features and results presented, we emphasize the variability in controlling the accuracy of these forces through the proper utilization of the power of a multi-pass laser beam (semi- or completely) locked within confined systems. The direct measurements of these forces, augmented due to the partial or total momentum transfer of the photons of a multi-pass laser beam extended from several hundreds of picoNewton (pN) up to sub-µN range for the same power of laser source, are done by a precision force measurement system and compared with basic theoretical computations. We also discuss the opportunities to probe the fundamental physical limits associated with this method and to the considerable extent other competing contributing effects that might be regarded as sources of errors in metrological tasks.

Modified Fabry-Perot interferometer for displacement measurement in ultra large measuring range.

Laser interferometers have demonstrated outstanding measuring performances for high precision positioning or dimensional measurements in the precision industry, especially in the length measurement. Due to the non-common-optical-path structure, appreciable measurement errors can be easily induced under ordinary measurement conditions. That will lead to the limitation and inconvenience for in situ industrial applications. To minimize the environmental and mechanical effects, a new interferometric displacement measuring system with the common-optical-path structure and the resistance to tilt-angle is proposed. With the integration of optomechatronic modules in the novel interferometric system, the resolution up to picometer order, high precision, and ultra large measuring range have been realized. For the signal stabilization of displacement measurement, an automatic gain control module has been proposed. A self-developed interpolation model has been employed for enhancing the resolution. The novel interferometer can hold the advantage of high resolution and large measuring range simultaneously. By the experimental verifications, it has been proven that the actual resolution of 2.5 nm can be achieved in the measuring range of 500 mm. According to the comparison experiments, the maximal standard deviation of the difference between the self-developed Fabry-Perot interferometer and the reference commercial Michelson interferometer is 0.146 µm in the traveling range of 500 mm. With the prominent measuring characteristics, this should be the largest dynamic measurement range of a Fabry-Perot interferometer up till now.

Multi-interferometric displacement measurement system with variable measurement mirrors.

Laser interferometers have been widely implemented for the displacement sensing and positioning calibration of the precision mechanical industry, due to their excellent measuring features and direct traceability to the dimensional definition. Currently some kinds of modified Fabry-Perot interferometers with a planar mirror or a corner cube prism as the measurement mirror have been proposed. Each optical structure of both models has the individual particularity and performance for measuring applications. In this investigation, a multi-interferometric displacement system has been proposed whose measurement mirror can be quickly and conveniently altered with a planar mirror or a corner cube reflector depending on the measuring demand. Some experimental results and analyses about the interpolation error and displacement measurements with both reflectors have been demonstrated. According to the results, suggestions about the choice of a measuring reflector and interpolation model have been presented. With the measuring verifications, the developed system with a maximum standard deviation less than 0.2081 µm in measuring range of 300 mm would be a compact and robust tool for sensing or calibrating the linear displacement of mechanical equipment.