RESUMO
The advancement of atomic layer deposition (ALD) techniques for the controlled growth of transition metal thin films is constantly growing due to the design and synthesis of novel organometallic (OM) precursors capable of facilitating precise deposition and clean film growth. In this context, acetamidinates have emerged as a highly promising family of OM precursors due to their exceptional attributes, including outstanding stability, favorable volatility, and reactivity at low evaporation and deposition temperatures. These unique properties make them a sought-after candidate for enabling ALD processes. Here we conducted an atomic-scale study to get an in-depth understanding of the first ALD partial reaction, which involves the adsorption and dissociation process of the silver acetamidinate on the Ag(110) surface. Our research sheds light on the multistep adsorption and breaking mechanism of the novel silver(I)-N,N'-dimethylacetamidinate precursor employed as the silver source. Since the difference in energy between the monomer and dimer phases of the precursor is only 1.92 eV, we have explored the adsorption states of both phases. The monomer adsorbs on the surface by occupying hollow (H) sites; after that, it dissociates and loses its ligand, adopting a perpendicular geometry via the formation of new Ag-N bonds with the pair of N atoms at the top sites of the surface. On the other hand, the dimer adsorbs on long-bridge sites (LB) with the pair of N atoms occupying top sites with the silver atoms from the surface. Next, the dimer loses a pair of N-Ag bonds on each ligand, reaching a more stable state of partial cleavage with a relative energy of -0.38 eV. After overcoming an energy barrier of 0.41 eV, the dimer loses the remaining pair of N-Ag bonds, and the silver atoms diffuse towards H sites. Finally, the ligands diffuse toward the adjacent channel in the [100] direction of the surface. A charge distribution analysis of the adsorption stages shows the evolution of the silver atoms from precursor to the metallic state.
RESUMO
Asymmetric Janus transition metal dichalcogenide MoSSe is a promising catalytic material due to the intrinsic in-plane dipole of its opposite faces. The atomic description of the structures observed by experimental techniques is relevant to tuning and optimizing its surface reaction processes. Furthermore, the experimentally observed triangular morphologies in MoSSe suggest that an analysis of the chemical environment of its edges is vital to understand its reactivity. Here we analyze the size-shape stability among different triangular structures-quantum- dots proposed from the ideal S(-1010) and Mo(10-10) terminations. Our stability analysis evidenced that the S-Se termination is more stable than Mo; moreover, as the size of the quantum dot increases, its stability increases as well. Besides, a trend is observed, with the appearance of elongated Mo-S/Se bonds at symmetric positions of the edges. Tersoff-Hamann scanning tunneling microscopy images for both faces of the stablest models are presented. Electrostatic potential isosurfaces denote that the basal plane on the S face of both configurations remains the region with more electron density concentration. These results point toward the differentiated activity over both faces. Finally, our study denotes the exact atomic arrangement on the edges of MoSSe quantum dots corresponding with the formation of S/Se dimers who decorates the edges and their role along with the faces as catalytic sites.
RESUMO
The formation of heterostructures that combine a large surface area with high surface activity has attracted the attention of the scientific community due to the unique properties and applications of these heterostructures. In this work, we describe - at the atomic level - the full reaction mechanisms involved in the atomic layer deposition of a hybrid ZnO/CNT inorganic structure. First, the pristine CNTs are chemically activated with a carboxylic acid, a process unique to carbon materials. Diethylzinc (DEZ) and water are used as gas-phase precursors to form ZnO. Our findings show that DEZ is physically adsorbed on the CNTs during the exposure of the first precursor. The ligand-exchange to generate chemisorbed ethyl zinc on the O side of the COOH group needs to overcome an energy barrier of 0.06 eV. This is a very small energy if compared to the values (0.5-0.6 eV) obtained in previous studies for OH functionalized surfaces. The height of the barrier is associated with the C[double bond, length as m-dash]O side, which mediates the H proton's exchange from the OH group to the C2H5 ligand. Furthermore, upon exposure to the oxidizing agent (H2O), ethyl zinc exchanges its last ligand as ethane, and it accepts a hydroxyl group through a self-limiting reaction with an energy barrier of 0.88 eV. Notice that the energy barrier of the second ligand-exchange is larger than of the first. We have also analyzed the effect in the saturation of the second precursor: as the quantity of water molecules increases, the long-range interactions tend to repel them. However, the energy barrier of the second ligand-exchange decreases from 1.53 eV to 0.88 eV for one and two water molecules, showing a clear dependence on the oxidizing agent. Non-covalent interactions are used as a tool to visualize the driving forces that take place during each partial reaction in real space. Our study points out the importance of using the right functionalization agent to achieve a controlled and conformal ALD growth at the initial steps of the formation of hybrid ZnO/CNT structures, as well as the role played by the oxidizing agent to lower the energy barrier on the second ALD step.
