1.
Adv Mater
; 28(16): 3069-77, 2016 Apr.
Artigo
em Inglês
| MEDLINE
| ID: mdl-26917352
RESUMO
A mogul-patterned stretchable substrate with multidirectional stretchability and minimal fracture of layers under high stretching is fabricated by double photolithography and soft lithography. Au layers and a reduced graphene oxide chemiresistor on a mogul-patterned poly(dimethylsiloxane) substrate are stable and durable under various stretching conditions. The newly designed mogul-patterned stretchable substrate shows great promise for stretchable electronics.