Your browser doesn't support javascript.
loading
Mostrar: 20 | 50 | 100
Resultados 1 - 3 de 3
Filtrar
Mais filtros








Base de dados
Intervalo de ano de publicação
1.
Carbohydr Polym ; 282: 119121, 2022 Apr 15.
Artigo em Inglês | MEDLINE | ID: mdl-35123760

RESUMO

There is an increasing interest in utilizing more sustainable and inherently biodegradable materials alternatives ideally derived from renewable resources for modern material applications, especially in the area of packaging materials. This work employed the polysaccharide alpha-1,3-glucan derived from an enzymatic polymerization process as a functional additive for natural rubber (NR) latex-based coating films. Coating formulations containing NR and 9-50 wt% alpha-1,3 glucan were prepared and then applied to paper substrates at different thicknesses. The effect of coating formulations on the barrier properties (e.g., oxygen, oil, water vapor barrier), the viscosity, and dry and wet tensile properties were investigated. The NR/glucan coatings exhibited outstanding tensile properties and balanced oxygen and oil barrier performance. However, higher glucan loading could be detrimental to moisture barrier. Overall, this study indicated that the NR/glucan coating films are comparable in performance to commercial coating formulations while providing a renewable, potential to be recycled with paper, and biodegradable alternative.

2.
Nanomaterials (Basel) ; 8(2)2018 Jan 24.
Artigo em Inglês | MEDLINE | ID: mdl-29364840

RESUMO

This work investigated the suppression of photocatalytic activity of titanium dioxide (TiO2) pigment powders by extremely thin aluminum oxide (Al2O3) films deposited via an atomic-layer-deposition-type process using trimethylaluminum (TMA) and H2O as precursors. The deposition was performed on multiple grams of TiO2 powder at room temperature and atmospheric pressure in a fluidized bed reactor, resulting in the growth of uniform and conformal Al2O3 films with thickness control at sub-nanometer level. The as-deposited Al2O3 films exhibited excellent photocatalytic suppression ability. Accordingly, an Al2O3 layer with a thickness of 1 nm could efficiently suppress the photocatalytic activities of rutile, anatase, and P25 TiO2 nanoparticles without affecting their bulk optical properties. In addition, the influence of high-temperature annealing on the properties of the Al2O3 layers was investigated, revealing the possibility of achieving porous Al2O3 layers. Our approach demonstrated a fast, efficient, and simple route to coating Al2O3 films on TiO2 pigment powders at the multigram scale, and showed great potential for large-scale production development.

3.
Materials (Basel) ; 8(3): 1249-1263, 2015 Mar 19.
Artigo em Inglês | MEDLINE | ID: mdl-28788000

RESUMO

We have deposited aluminium oxide films by atomic layer deposition on titanium oxide nanoparticles in a fluidized bed reactor at 27 ± 3 °C and atmospheric pressure. Working at room temperature allows coating heat-sensitive materials, while working at atmospheric pressure would simplify the scale-up of this process. We performed 4, 7 and 15 cycles by dosing a predefined amount of precursors, i.e., trimethyl aluminium and water. We obtained a growth per cycle of 0.14-0.15 nm determined by transmission electron microscopy (TEM), similar to atomic layer deposition (ALD) experiments at a few millibars and ~180 °C. We also increased the amount of precursors dosed by a factor of 2, 4 and 6 compared to the base case, maintaining the same purging time. The growth per cycle (GPC) increased, although not linearly, with the dosing time. In addition, we performed an experiment at 170 °C and 1 bar using the dosing times increased by factor 6, and obtained a growth per cycle of 0.16 nm. These results were verified with elemental analysis, which showed a good agreement with the results from TEM pictures. Thermal gravimetric analysis (TGA) showed a negligible amount of unreacted molecules inside the alumina films. Overall, the dosage of the precursors is crucial to control precisely the growth of the alumina films at atmospheric pressure and room temperature. Dosing excess of precursor provokes a chemical vapour deposition type of growth due to the physisorption of molecules on the particles, but this can be avoided by working at high temperatures.

SELEÇÃO DE REFERÊNCIAS
DETALHE DA PESQUISA