Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources.

Sobierajski, R; Bruijn, S; Khorsand, A R; Louis, E; van de Kruijs, R W E; Burian, T; Chalupsky, J; Cihelka, J; Gleeson, A; Grzonka, J; Gullikson, E M; Hajkova, V; Hau-Riege, S; Juha, L; Jurek, M; Klinger, D; Krzywinski, J; London, R; Pelka, J B; Plocinski, T; Rasinski, M; Tiedtke, K; Toleikis, S; Vysin, L; Wabnitz, H; Bijkerk, F

Sobierajski, R; Bruijn, S; Khorsand, A R; Louis, E; van de Kruijs, R W E; Burian, T; Chalupsky, J; Cihelka, J; Gleeson, A; Grzonka, J; Gullikson, E M; Hajkova, V; Hau-Riege, S; Juha, L; Jurek, M; Klinger, D; Krzywinski, J; London, R; Pelka, J B; Plocinski, T; Rasinski, M; Tiedtke, K; Toleikis, S; Vysin, L; Wabnitz, H; Bijkerk, F.

Affiliation

Sobierajski R; FOM-Institute for Plasma Physics Rijnhuizen, Nieuwegein, Netherlands. ryszard.sobierajski@ifpan.edu.pl

Opt Express ; 19(1): 193-205, 2011 Jan 03.

Article in En | MEDLINE | ID: mdl-21263557

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