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Physical structure and inversion charge at a semiconductor interface with a crystalline oxide.
McKee, R A; Walker, F J; Chisholm, M F.
Afiliação
  • McKee RA; Oak Ridge National Laboratory, Oak Ridge, TN 37831-6118, USA.
Science ; 293(5529): 468-71, 2001 Jul 20.
Article em En | MEDLINE | ID: mdl-11463909
We show that the physical and electrical structure and hence the inversion charge for crystalline oxides on semiconductors can be understood and systematically manipulated at the atomic level. Heterojunction band offset and alignment are adjusted by atomic-level structural and chemical changes, resulting in the demonstration of an electrical interface between a polar oxide and a semiconductor free of interface charge. In a broader sense, we take the metal oxide semiconductor device to a new and prominent position in the solid-state electronics timeline. It can now be extensively developed using an entirely new physical system: the crystalline oxides-on-semiconductors interface.
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Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Science Ano de publicação: 2001 Tipo de documento: Article
Buscar no Google
Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Science Ano de publicação: 2001 Tipo de documento: Article