Tuning the limiting thickness of a thin oxide layer on Al(111) with oxygen gas pressure.
Phys Rev Lett
; 107(3): 035502, 2011 Jul 15.
Article
em En
| MEDLINE
| ID: mdl-21838375
ABSTRACT
We report an x-ray photoelectron spectroscopy study of the oxidation of Al(111) surfaces at room temperature, which reveals that the limiting thickness of an aluminum oxide film can be tuned by using oxygen pressure. This behavior is attributed to a strong dependence of the kinetic potential on the oxygen gas pressure. The coverage of oxygen anions on the surface of the oxide film depends on the gas pressure leading to a pressure dependence of the kinetic potential. Our results indicate that a significantly large oxygen pressure (>1 Torr) is required to develop the saturated surface coverage of oxygen ions, which results in the maximum kinetic potential and therefore the saturated limiting thickness of the oxide film.
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01-internacional
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MEDLINE
Idioma:
En
Revista:
Phys Rev Lett
Ano de publicação:
2011
Tipo de documento:
Article