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Facet-Independent Electric-Field-Induced Volume Metallization of Tungsten Trioxide Films.
Altendorf, Simone G; Jeong, Jaewoo; Passarello, Donata; Aetukuri, Nagaphani B; Samant, Mahesh G; Parkin, Stuart S P.
Afiliação
  • Altendorf SG; IBM Almaden Research Center, San Jose, CA, 95120, USA.
  • Jeong J; Max Planck Institute for Microstructure Physics, 06120, Halle, Germany.
  • Passarello D; IBM Almaden Research Center, San Jose, CA, 95120, USA.
  • Aetukuri NB; IBM Almaden Research Center, San Jose, CA, 95120, USA.
  • Samant MG; Graduate School of Excellence Materials Science in Mainz, Johannes Gutenberg University, Staudingerweg 9, 55128, Mainz, Germany.
  • Parkin SS; Fachbereich Physik, University of Kaiserslautern, Erwin-Schrödinger-Strasse 56, 67663, Kaiserslautern, Germany.
Adv Mater ; 28(26): 5284-92, 2016 Jul.
Article em En | MEDLINE | ID: mdl-27159503
ABSTRACT
Reversible metallization of band and Mott insulators by ionic-liquid gating is accompanied by significant structural changes. A change in conductivity of seven orders of magnitude at room temperature is found in epitaxial films of WO3 with an associated monoclinic-to-cubic structural reorganization. The migration of oxygen ions along open volume channels is the underlying mechanism.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Adv Mater Ano de publicação: 2016 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Adv Mater Ano de publicação: 2016 Tipo de documento: Article