Spin Hall Effect and Origins of Nonlocal Resistance in Adatom-Decorated Graphene.

Van Tuan, D; Marmolejo-Tejada, J M; Waintal, X; Nikolic, B K; Valenzuela, S O; Roche, S

Van Tuan, D; Marmolejo-Tejada, J M; Waintal, X; Nikolic, B K; Valenzuela, S O; Roche, S.

Afiliação

Van Tuan D; Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and The Barcelona Institute of Science and Technology, Campus UAB, Bellaterra, 08193 Barcelona, Spain.
Marmolejo-Tejada JM; Department of Electrical and Computer Engineering, University of Rochester, Rochester, New York 14627, USA.
Waintal X; Department of Physics and Astronomy, University of Delaware, Newark, Delaware 19716-2570, USA.
Nikolic BK; School of Electrical and Electronics Engineering, Universidad del Valle, Cali AA 25360, Colombia.
Valenzuela SO; Univ. Grenoble Alpes, INAC-PHELIQS, F-38000 Grenoble, France and CEA, INAC-PHELIQS, F-38000 Grenoble, France.
Roche S; Department of Physics and Astronomy, University of Delaware, Newark, Delaware 19716-2570, USA.

Phys Rev Lett ; 117(17): 176602, 2016 Oct 21.

Article em En | MEDLINE | ID: mdl-27824472

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Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Prognostic_studies Idioma: En Revista: Phys Rev Lett Ano de publicação: 2016 Tipo de documento: Article

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