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Etching and Chemical Control of the Silicon Nitride Surface.
Brunet, Marine; Aureau, Damien; Chantraine, Paul; Guillemot, François; Etcheberry, Arnaud; Gouget-Laemmel, Anne Chantal; Ozanam, François.
Afiliação
  • Brunet M; Laboratoire de Physique de la Matière Condensée, Ecole Polytechnique, CNRS, Université Paris-Saclay , 91128 Palaiseau, France.
  • Aureau D; Saint-Gobain Recherche , 39 quai Lucien Lefranc, 93303 Aubervilliers, France.
  • Chantraine P; Institut Lavoisier, UVSQ-CNRS UMR 8180 , 78035 Versailles, France.
  • Guillemot F; Laboratoire de Physique de la Matière Condensée, Ecole Polytechnique, CNRS, Université Paris-Saclay , 91128 Palaiseau, France.
  • Etcheberry A; Saint-Gobain Recherche , 39 quai Lucien Lefranc, 93303 Aubervilliers, France.
  • Gouget-Laemmel AC; Institut Lavoisier, UVSQ-CNRS UMR 8180 , 78035 Versailles, France.
  • Ozanam F; Laboratoire de Physique de la Matière Condensée, Ecole Polytechnique, CNRS, Université Paris-Saclay , 91128 Palaiseau, France.
ACS Appl Mater Interfaces ; 9(3): 3075-3084, 2017 Jan 25.
Article em En | MEDLINE | ID: mdl-27977928
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Ano de publicação: 2017 Tipo de documento: Article
Texto completo
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XML
PubMed Links
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Ano de publicação: 2017 Tipo de documento: Article