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Probing the ultimate plasmon confinement limits with a van der Waals heterostructure.
Alcaraz Iranzo, David; Nanot, Sébastien; Dias, Eduardo J C; Epstein, Itai; Peng, Cheng; Efetov, Dmitri K; Lundeberg, Mark B; Parret, Romain; Osmond, Johann; Hong, Jin-Yong; Kong, Jing; Englund, Dirk R; Peres, Nuno M R; Koppens, Frank H L.
Afiliação
  • Alcaraz Iranzo D; Institut de Ciències Fotòniques (ICFO)-The Institute of Photonic Sciences, The Barcelona Institute of Science and Technology, 08860 Castelldefels (Barcelona), Spain.
  • Nanot S; Institut de Ciències Fotòniques (ICFO)-The Institute of Photonic Sciences, The Barcelona Institute of Science and Technology, 08860 Castelldefels (Barcelona), Spain.
  • Dias EJC; Laboratoire Charles Coulomb (L2C), Université de Montpellier, CNRS, 34095 Montpellier Cedex, France.
  • Epstein I; Centro de Física and Departamento de Física and QuantaLab, Universidade do Minho, P-4710-057 Braga, Portugal.
  • Peng C; Institut de Ciències Fotòniques (ICFO)-The Institute of Photonic Sciences, The Barcelona Institute of Science and Technology, 08860 Castelldefels (Barcelona), Spain.
  • Efetov DK; Department of Electrical Engineering and Computer Sciences, Massachusetts Institute of Technology, Cambridge, MA 02139, USA.
  • Lundeberg MB; Institut de Ciències Fotòniques (ICFO)-The Institute of Photonic Sciences, The Barcelona Institute of Science and Technology, 08860 Castelldefels (Barcelona), Spain.
  • Parret R; Department of Electrical Engineering and Computer Sciences, Massachusetts Institute of Technology, Cambridge, MA 02139, USA.
  • Osmond J; Institut de Ciències Fotòniques (ICFO)-The Institute of Photonic Sciences, The Barcelona Institute of Science and Technology, 08860 Castelldefels (Barcelona), Spain.
  • Hong JY; Institut de Ciències Fotòniques (ICFO)-The Institute of Photonic Sciences, The Barcelona Institute of Science and Technology, 08860 Castelldefels (Barcelona), Spain.
  • Kong J; Institut de Ciències Fotòniques (ICFO)-The Institute of Photonic Sciences, The Barcelona Institute of Science and Technology, 08860 Castelldefels (Barcelona), Spain.
  • Englund DR; Department of Electrical Engineering and Computer Sciences, Massachusetts Institute of Technology, Cambridge, MA 02139, USA.
  • Peres NMR; Department of Electrical Engineering and Computer Sciences, Massachusetts Institute of Technology, Cambridge, MA 02139, USA.
  • Koppens FHL; Department of Electrical Engineering and Computer Sciences, Massachusetts Institute of Technology, Cambridge, MA 02139, USA.
Science ; 360(6386): 291-295, 2018 04 20.
Article em En | MEDLINE | ID: mdl-29674587

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Science Ano de publicação: 2018 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Science Ano de publicação: 2018 Tipo de documento: Article