Quantification and optimization of ADF-STEM image contrast for beam-sensitive materials.

Gnanasekaran, Karthikeyan; de With, Gijsbertus; Friedrich, Heiner

Gnanasekaran, Karthikeyan; de With, Gijsbertus; Friedrich, Heiner.

Afiliação

Gnanasekaran K; Laboratory of Materials and Interface Chemistry, Department of Chemical Engineering and Chemistry, Eindhoven University of Technology, Eindhoven, The Netherlands.
de With G; Laboratory of Materials and Interface Chemistry, Department of Chemical Engineering and Chemistry, Eindhoven University of Technology, Eindhoven, The Netherlands.
Friedrich H; Laboratory of Materials and Interface Chemistry, Department of Chemical Engineering and Chemistry, Eindhoven University of Technology, Eindhoven, The Netherlands.

R Soc Open Sci ; 5(5): 171838, 2018 May.

Article em En | MEDLINE | ID: mdl-29892376

Palavras-chave

Monte Carlo simulations; beam-sensitive materials; electron dose; image contrast; low-contrast materials; scanning transmission electron microscopy

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Diagnostic_studies Idioma: En Revista: R Soc Open Sci Ano de publicação: 2018 Tipo de documento: Article

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