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High-K dielectric sulfur-selenium alloys.
Susarla, Sandhya; Tsafack, Thierry; Owuor, Peter Samora; Puthirath, Anand B; Hachtel, Jordan A; Babu, Ganguli; Apte, Amey; Jawdat, BenMaan I; Hilario, Martin S; Lerma, Albert; Calderon, Hector A; Robles Hernandez, Francisco C; Tam, David W; Li, Tong; Lupini, Andrew R; Idrobo, Juan Carlos; Lou, Jun; Wei, Bingqing; Dai, Pengcheng; Tiwary, Chandra Sekhar; Ajayan, Pulickel M.
Afiliação
  • Susarla S; Department of Materials Science and Nano-engineering, Rice University, Houston, TX 77005, USA.
  • Tsafack T; Department of Materials Science and Nano-engineering, Rice University, Houston, TX 77005, USA.
  • Owuor PS; Department of Materials Science and Nano-engineering, Rice University, Houston, TX 77005, USA.
  • Puthirath AB; Department of Materials Science and Nano-engineering, Rice University, Houston, TX 77005, USA.
  • Hachtel JA; Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
  • Babu G; Department of Materials Science and Nano-engineering, Rice University, Houston, TX 77005, USA.
  • Apte A; Department of Materials Science and Nano-engineering, Rice University, Houston, TX 77005, USA.
  • Jawdat BI; Department of Materials Science and Nano-engineering, Rice University, Houston, TX 77005, USA.
  • Hilario MS; Air Force Research Laboratory, Kirtland Air Force Base, Albuquerque, NM 87117, USA.
  • Lerma A; Leidos Inc., Albuquerque, NM 87106, USA.
  • Calderon HA; Mechanical Engineering Technology, University of Houston, Houston, TX 77204, USA.
  • Robles Hernandez FC; Instituto Politécnico Nacional, ESFM, UPALM, Zacatenco, Mexico CDMX 07338, Mexico.
  • Tam DW; Department of Physics and Astronomy, Rice University, Houston, TX 77005, USA.
  • Li T; Department of Mechanical Engineering, University of Delaware, Newark, DE 19716, USA.
  • Lupini AR; Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
  • Idrobo JC; Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA.
  • Lou J; Department of Materials Science and Nano-engineering, Rice University, Houston, TX 77005, USA.
  • Wei B; Department of Mechanical Engineering, University of Delaware, Newark, DE 19716, USA.
  • Dai P; Department of Physics and Astronomy, Rice University, Houston, TX 77005, USA.
  • Tiwary CS; Department of Materials Science and Nano-engineering, Rice University, Houston, TX 77005, USA.
  • Ajayan PM; Department of Materials Science and Engineering, Indian Institute of Technology, Kharagpur-721302, India.
Sci Adv ; 5(5): eaau9785, 2019 May.
Article em En | MEDLINE | ID: mdl-31093523
ABSTRACT
Upcoming advancements in flexible technology require mechanically compliant dielectric materials. Current dielectrics have either high dielectric constant, K (e.g., metal oxides) or good flexibility (e.g., polymers). Here, we achieve a golden mean of these properties and obtain a lightweight, viscoelastic, high-K dielectric material by combining two nonpolar, brittle constituents, namely, sulfur (S) and selenium (Se). This S-Se alloy retains polymer-like mechanical flexibility along with a dielectric strength (40 kV/mm) and a high dielectric constant (K = 74 at 1 MHz) similar to those of established metal oxides. Our theoretical model suggests that the principal reason is the strong dipole moment generated due to the unique structural orientation between S and Se atoms. The S-Se alloys can bridge the chasm between mechanically soft and high-K dielectric materials toward several flexible device applications.

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Sci Adv Ano de publicação: 2019 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Sci Adv Ano de publicação: 2019 Tipo de documento: Article