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Atomically thin three-dimensional membranes of van der Waals semiconductors by wafer-scale growth.
Jin, Gangtae; Lee, Chang-Soo; Liao, Xing; Kim, Juho; Wang, Zhen; Okello, Odongo Francis Ngome; Park, Bumsu; Park, Jaehyun; Han, Cheolhee; Heo, Hoseok; Kim, Jonghwan; Oh, Sang Ho; Choi, Si-Young; Park, Hongkun; Jo, Moon-Ho.
Afiliação
  • Jin G; Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), Pohang 37673, Republic of Korea.
  • Lee CS; Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea.
  • Liao X; Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), Pohang 37673, Republic of Korea.
  • Kim J; Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea.
  • Wang Z; Department of Chemistry and Chemical Biology and Department of Physics, Harvard University, Cambridge, MA 02138, USA.
  • Okello OFN; Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), Pohang 37673, Republic of Korea.
  • Park B; Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea.
  • Park J; Department of Energy Science, Sungkyunkwan University, Suwon 16419, Republic of Korea.
  • Han C; Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea.
  • Heo H; Department of Energy Science, Sungkyunkwan University, Suwon 16419, Republic of Korea.
  • Kim J; Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), Pohang 37673, Republic of Korea.
  • Oh SH; Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea.
  • Choi SY; Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), Pohang 37673, Republic of Korea.
  • Park H; Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea.
  • Jo MH; Department of Chemistry and Chemical Biology and Department of Physics, Harvard University, Cambridge, MA 02138, USA.
Sci Adv ; 5(7): eaaw3180, 2019 Jul.
Article em En | MEDLINE | ID: mdl-31360767

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Sci Adv Ano de publicação: 2019 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Sci Adv Ano de publicação: 2019 Tipo de documento: Article