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Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers.
Pound-Lana, Gwenaelle; Bézard, Philippe; Petit-Etienne, Camille; Cavalaglio, Sébastien; Cunge, Gilles; Cabannes-Boué, Benjamin; Fleury, Guillaume; Chevalier, Xavier; Zelsmann, Marc.
Afiliação
  • Pound-Lana G; Univ. Grenoble Alpes, CNRS, CEA/LETI Minatec, Grenoble INP, LTM, 38000 Grenoble, France.
  • Bézard P; Univ. Grenoble Alpes, CNRS, CEA/LETI Minatec, Grenoble INP, LTM, 38000 Grenoble, France.
  • Petit-Etienne C; Univ. Grenoble Alpes, CNRS, CEA/LETI Minatec, Grenoble INP, LTM, 38000 Grenoble, France.
  • Cavalaglio S; Univ. Grenoble Alpes, CNRS, CEA/LETI Minatec, Grenoble INP, LTM, 38000 Grenoble, France.
  • Cunge G; Univ. Grenoble Alpes, CNRS, CEA/LETI Minatec, Grenoble INP, LTM, 38000 Grenoble, France.
  • Cabannes-Boué B; Univ. Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France.
  • Fleury G; Univ. Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France.
  • Chevalier X; ARKEMA FRANCE, GRL, Route Nationale 117, BP34, 64170 Lacq, France.
  • Zelsmann M; Univ. Grenoble Alpes, CNRS, CEA/LETI Minatec, Grenoble INP, LTM, 38000 Grenoble, France.
ACS Appl Mater Interfaces ; 13(41): 49184-49193, 2021 Oct 20.
Article em En | MEDLINE | ID: mdl-34636239

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Ano de publicação: 2021 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Ano de publicação: 2021 Tipo de documento: Article