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AC-assisted deposition of aggregate free silica films with vertical pore structure.
Moehl, Gilles E; Nasir, Tauqir; Han, Yisong; Noori, Yasir J; Huang, Ruomeng; Beanland, Richard; Bartlett, Philip N; Hector, Andrew L.
Afiliação
  • Moehl GE; School of Chemistry, University of Southampton, SO17 1BJ, UK. A.L.Hector@soton.ac.uk.
  • Nasir T; School of Chemistry, University of Southampton, SO17 1BJ, UK. A.L.Hector@soton.ac.uk.
  • Han Y; Department of Physics, University of Warwick, CV4 7AL, UK.
  • Noori YJ; School of Electronics and Computer Science, University of Southampton, SO17 1BJ, UK.
  • Huang R; School of Electronics and Computer Science, University of Southampton, SO17 1BJ, UK.
  • Beanland R; Department of Physics, University of Warwick, CV4 7AL, UK.
  • Bartlett PN; School of Chemistry, University of Southampton, SO17 1BJ, UK. A.L.Hector@soton.ac.uk.
  • Hector AL; School of Chemistry, University of Southampton, SO17 1BJ, UK. A.L.Hector@soton.ac.uk.
Nanoscale ; 14(14): 5404-5411, 2022 Apr 07.
Article em En | MEDLINE | ID: mdl-35320330
Silica thin films with vertical nanopores are useful to control access to electrode surfaces and may act as templates for growth of nanomaterials. The most effective method to produce these films, electrochemically assisted surfactant assembly, also produces aggregates of silica particles. This paper shows that growth with an AC signal superimposed onto the potential avoids the aggregates and only very small numbers of single particles are found. This finding is linked to better control of the diffusion field of hydroxide ions that are responsible for particle growth. The resultant films are smooth, with very well-ordered hexagonal pore structures.

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanoscale Ano de publicação: 2022 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanoscale Ano de publicação: 2022 Tipo de documento: Article