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Order-to-Disorder Transitions in Lamellar Melt Self-Assembled Core-Shell Bottlebrush Polymers.
Karavolias, Michael G; Elder, Jack B; Ness, Emily M; Mahanthappa, Mahesh K.
Afiliação
  • Karavolias MG; Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue SE, Minneapolis, Minnesota 55455, United States.
  • Elder JB; Department of Chemistry, University of Minnesota, 207 Pleasant Street SE, Minneapolis, Minnesota 55455, United States.
  • Ness EM; Department of Chemistry, Pacific Lutheran University, Rieke Science Center, 12180 Park Avenue S, Tacoma, Washington 98447, United States.
  • Mahanthappa MK; Department of Chemical Engineering and Materials Science, University of Minnesota, 421 Washington Avenue SE, Minneapolis, Minnesota 55455, United States.
ACS Macro Lett ; 8(12): 1617-1622, 2019 Dec 17.
Article em En | MEDLINE | ID: mdl-35619390
ABSTRACT
We report the synthesis and melt self-assembly behaviors of densely grafted, core-shell bottlebrush (csBB) polymers derived from covalently linking narrow dispersity, symmetric composition ABA-type triblock polymers through their chain midpoints. Derived from sequential ring-opening polymerizations of ε-decalactone and rac-lactide initiated from 5-norbornene-2-exo,3-exo-dimethanol, poly(lactide-block-ε-decalactone-block-lactide) macromonomers (Mn = 9.2-17.8 kg/mol; D = 1.19-1.25) were enchained by living ring-opening metathesis polymerization (ROMP) into csBBs with backbone degrees of polymerization Nbb = 8-43. Temperature-dependent small-angle X-ray scattering (SAXS) studies indicate that the critical triblock arm degree of polymerization (Narm) required for melt segregation decreases with increasing Nbb, leading to reductions in the accessible ordered lamellar microdomain (d) spacings. We derive a phenomenological relationship between the critical triblock arm segregation strength at the order-disorder transition (χNarm)ODT and Nbb to enable the future design of microphase separated core-shell bottlebrushes, which self-assemble at sub-10 nm length scales for nanolithography and nanotemplating applications.

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Qualitative_research Idioma: En Revista: ACS Macro Lett Ano de publicação: 2019 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Qualitative_research Idioma: En Revista: ACS Macro Lett Ano de publicação: 2019 Tipo de documento: Article