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Ferroelectricity and Oxide Reliability of Stacked Hafnium-Zirconium Oxide Devices.
Liao, Ruo-Yin; Chen, Hsuan-Han; Lin, Ping-Yu; Liang, Ting-An; Su, Kuan-Hung; Lin, I-Cheng; Wen, Chen-Hao; Chou, Wu-Ching; Hsu, Hsiao-Hsuan; Cheng, Chun-Hu.
Afiliação
  • Liao RY; Department of Electro-Physics, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.
  • Chen HH; Department of Electro-Physics, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.
  • Lin PY; Institute of Materials Science and Engineering, National Taipei University of Technology, Taipei 10608, Taiwan.
  • Liang TA; Institute of Materials Science and Engineering, National Taipei University of Technology, Taipei 10608, Taiwan.
  • Su KH; Institute of Materials Science and Engineering, National Taipei University of Technology, Taipei 10608, Taiwan.
  • Lin IC; Institute of Materials Science and Engineering, National Taipei University of Technology, Taipei 10608, Taiwan.
  • Wen CH; Department of Mechatronic Engineering, National Taiwan Normal University, Taipei 10610, Taiwan.
  • Chou WC; Department of Electro-Physics, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.
  • Hsu HH; Institute of Materials Science and Engineering, National Taipei University of Technology, Taipei 10608, Taiwan.
  • Cheng CH; Department of Mechatronic Engineering, National Taiwan Normal University, Taipei 10610, Taiwan.
Materials (Basel) ; 16(9)2023 Apr 23.
Article em En | MEDLINE | ID: mdl-37176188
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Materials (Basel) Ano de publicação: 2023 Tipo de documento: Article
Texto completo
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Materials (Basel) Ano de publicação: 2023 Tipo de documento: Article