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Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer Deposition.
Chung, Hong Keun; Kim, Han; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Chung, Yoon Jang; Baek, Seung-Hyub; Park, Tae Joo; Kim, Seong Keun.
Afiliação
  • Chung HK; Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea.
  • Kim H; Department of Materials Science and Chemical Engineering, Hanyang University, Ansan 15588, South Korea.
  • Jeon J; Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea.
  • Kim SC; KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul 02841, South Korea.
  • Won SO; Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea.
  • Harada R; KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul 02841, South Korea.
  • Tsugawa T; Advanced Analysis Center, Korea Institute of Science and Technology, Seoul 02792, South Korea.
  • Chung YJ; Advanced Analysis Center, Korea Institute of Science and Technology, Seoul 02792, South Korea.
  • Baek SH; Chemical Materials Development Division, TANAKA Precious Metals, Tsukuba 300-4247, Japan.
  • Park TJ; Chemical Materials Development Division, TANAKA Precious Metals, Tsukuba 300-4247, Japan.
  • Kim SK; Department of Chemical and Biological Engineering, Korea University, Seoul 02841, South Korea.
J Phys Chem Lett ; 14(28): 6486-6493, 2023 Jul 20.
Article em En | MEDLINE | ID: mdl-37439679

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: J Phys Chem Lett Ano de publicação: 2023 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: J Phys Chem Lett Ano de publicação: 2023 Tipo de documento: Article